Visible light-driven g-C3N4@ ZnO heterojunction photocatalyst synthesized via atomic layer deposition with a specially designed rotary reactor E Jang, DW Kim, SH Hong, YM Park, TJ Park Applied Surface Science 487, 206-210, 2019 | 57 | 2019 |
Atomic layer deposition with rotary reactor for uniform hetero-junction photocatalyst, gC 3 N 4@ TiO 2 core–shell structures E Jang, WJ Kim, DW Kim, SH Hong, I Ali, YM Park, TJ Park RSC advances 9 (57), 33180-33186, 2019 | 27 | 2019 |
Improved CdS quantum dot distribution on a TiO2 photoanode by an atomic-layer-deposited ZnS passivation layer for quantum dot-sensitized solar cells ES Jung, MA Basit, MA Abbas, I Ali, DW Kim, YM Park, JH Bang, TJ Park Solar Energy Materials and Solar Cells 218, 110753, 2020 | 19 | 2020 |
High quality interfacial sulfur passivation via H2S pre-deposition annealing for atomic-layer-deposited HfO2 film on Ge substrate Tae Jun Seok, Young Jin Cho, Hyun Soo Jin, Dae Hyun Kim, Dae Woong Kim, Sang ... J. Mater. Chem. C 4, 850-856, 2016 | 17 | 2016 |
Seebeck-voltage-triggered self-biased photoelectrochemical water splitting using HfOx/SiOx bi-layer protected Si photocathode JY Jung, DW Kim, DH Kim, TJ Park, RB Wehrspohn, JH Lee Scientific Reports 9 (1), 9132, 2019 | 16 | 2019 |
Improved interface properties of atomic-layer-deposited HfO2 film on InP using interface sulfur passivation with H2S pre-deposition annealing Hyun Soo Jin, Young Jin Cho, Tae Jun Seok, Dae Hyun Kim, Dae Woong Kim, Sang ... App. Surf. Sci 357, 2036-2312, 2015 | 16* | 2015 |
Interface sulfur passivation using H2S annealing for atomic-layer-deposited Al2O3 films on ultrathin-body In0.53Ga0.47As-on-insulator Hyun Soo Jin, Young Jin Cho, Sang-Moon Lee, Dae Hyun Kim, Dae Woong Kim ... Appl. Surf. Sci. 315, 178-183, 2014 | 16 | 2014 |
Modernized H2S-treatment of TiO2 nanoparticles: Improving quantum-dot deposition for enhanced photocatalytic performance I Ali, M Muhyuddin, N Mullani, DW Kim, DH Kim, MA Basit, TJ Park Current Applied Physics 20 (3), 384-390, 2020 | 15 | 2020 |
Enhanced PbS quantum dot loading on TiO2 photoanode using atomic-layer-deposited ZnS interfacial layer for quantum dot-sensitized solar cells MA Basit, MA Abbas, ES Jung, I Ali, DW Kim, JH Bang, TJ Park Materials Chemistry and Physics, 2018 | 12 | 2018 |
Design guidelines of insulator for improving stability and performance of nanoelectrocatalyst/insulator/semiconductor photoelectrochemical cells JY Jung, DW Kim, TJ Park, JH Lee ACS Applied Energy Materials 3 (1), 1046-1053, 2019 | 11 | 2019 |
Sulfur-Enhanced Field-Effect Passivation using (NH4)2S Surface Treatment for Black Si Solar Cells DW Kim, JW Song, HS Jin, B Yoo, JH Lee, TJ Park ACS Applied Materials & Interfaces 11 (28), 25140−25146, 2019 | 11 | 2019 |
Black Si Photocathode with a Conformal and Amorphous MoSx Catalytic Layer Grown Using Atomic Layer Deposition for Photoelectrochemical Hydrogen Evolution DW Kim, JY Jung, DH Kim, JY Yu, JH Jang, HS Jin, TJ Seok, YS Min, ... ACS Applied Materials & Interfaces 14 (12), 14137-14145, 2022 | 4 | 2022 |
Novel field-effect passivation for nanostructured Si solar cells using interfacial sulfur incorporation DW Kim, JW Song, YM Park, JH Lee, TJ Park Progress in Photovoltaics, 2017 | 4 | 2017 |
Bipolar Energetics and Bifunctional Catalytic Activity of a Nanocrystalline Ru Thin-film Enable High-performance Photoelectrochemical Water Reduction and Oxidation JY Jung, DW Kim, S Shinde, SH Kim, DH Kim, C Lin, TJ Park, JH Lee ACS Applied Materials & Interfaces, 2020 | 2 | 2020 |
Thermoelectric composite, preparation method therefor, and thermoelectric device and semiconductor device each comprising thermoelectric composite TJ Park, SW Lee, DW Kim, TJ Seok, JH Yoon, JH Choi US Patent App. 18/163,694, 2023 | | 2023 |
Transition metal-dichalcogenide thin film and manufacturing method therefor TJ Park, DH Kim, D Kim, TJ Seok, H Jin US Patent 11,649,545, 2023 | | 2023 |
Catalyst for electrochemical cell and method of manufacturing same JH Yu, JY Kim, TJ Park, DW Kim, MJ Lee US Patent App. 17/724,189, 2022 | | 2022 |
Electrode structure and manufacturing method thereof TJ Park, DW Kim, KM Kwon US Patent App. 17/593,089, 2022 | | 2022 |
High-quality SiNx thin film growth at 300 ℃ using atomic layer deposition with hollow cathode plasma JC Park, DH Kim, TJ Seok, DW Kim, JH Ahn, WH Kim, TJ Park 한국표면공학회 학술발표회 초록집, 238-238, 2022 | | 2022 |
Black Si Photocathode with a Conformal and Amorphous MoSₓ Catalytic Layer Grown Using Atomic Layer Deposition for Photoelectrochemical Hydrogen Evolution DW Kim, JY Jung, DH Kim, JY Yu, JH Jang, HS Jin, TJ Seok, YS Min, ... | | 2022 |