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| Metrology of 50nm HP wire-grid polarizer: a SEM-scatterometry comparison R Zhu, A Munoz, SRJ Brueck, S Singhanl, SV Sreenivasan Metrology, Inspection, and Process Control for Microlithography XXIX 9424 …, 2015 | 5 | 2015 |
| Scatterometry of 50 nm half pitch features R Zhu The University of New Mexico, 2016 | 1 | 2016 |
| Method and system for in-line optical scatterometry SRJ Brueck, JJF BRICENO, ZHU Ruichao US Patent 11,327,012, 2022 | | 2022 |
| Method and system for in-line optical scatterometry RZ Steven R.J. BRUECK, Juan Jose FARIA BRICENO WO Patent WO2019217330A1, 2019 | | 2019 |
| Integration of block-copolymer with nano-imprint lithography: pushing the boundaries of emerging nano-patterning technology. GL Brennecka, DB Burckel, CYP Yang, MC George, J Skinner, ... Sandia National Lab.(SNL-NM), Albuquerque, NM (United States); Sandia …, 2012 | | 2012 |
