|Sub‐5 nm Patterning by Directed Self‐Assembly of Oligo (Dimethylsiloxane) Liquid Crystal Thin Films|
K Nickmans, JN Murphy, B de Waal, P Leclère, J Doise, R Gronheid, ...
Advanced Materials 28 (45), 10068-10072, 2016
|Implementation of templated DSA for via layer patterning at the 7nm node|
R Gronheid, J Doise, J Bekaert, BT Chan, I Karageorgos, J Ryckaert, ...
Alternative Lithographic Technologies VII 9423, 942305, 2015
|Implementation of surface energy modification in graphoepitaxy directed self-assembly for hole multiplication|
J Doise, J Bekaert, BT Chan, R Gronheid, Y Cao, SE Hong, G Lin, ...
Journal of Vacuum Science & Technology B, Nanotechnology and …, 2015
|Process optimization of templated DSA flows|
R Gronheid, J Bekaert, VKM Kuppuswamy, N Vandenbroeck, J Doise, ...
Advances in Patterning Materials and Processes XXXI 9051, 90510I, 2014
|N7 logic via patterning using templated DSA: implementation aspects|
J Bekaert, J Doise, R Gronheid, J Ryckaert, G Vandenberghe, G Fenger, ...
Photomask Japan 2015: Photomask and Next-Generation Lithography Mask …, 2015
|Contact hole multiplication using grapho-epitaxy directed self-assembly: process choices, template optimization, and placement accuracy|
J Bekaert, J Doise, VKM Kuppuswamy, R Gronheid, BT Chan, ...
30th European Mask and Lithography Conference 9231, 92310R, 2014
|EUV patterned templates with grapho-epitaxy DSA at the N5/N7 logic nodes|
R Gronheid, C Boeckx, J Doise, J Bekaert, I Karageorgos, J Ruckaert, ...
Extreme Ultraviolet (EUV) Lithography VII 9776, 97761W, 2016
|Strategies for Increasing the Rate of Defect Annihilation in the Directed Self-Assembly of High-χ Block Copolymers|
J Doise, JH Koh, JY Kim, Q Zhu, N Kinoshita, HS Suh, PR Delgadillo, ...
ACS applied materials & interfaces 11 (51), 48419-48427, 2019
|Influence of template fill in graphoepitaxy directed self-assembly|
J Doise, JP Bekaert, BT Chan, SE Hong, G Lin, R Gronheid
Journal of Micro/Nanolithography, MEMS, and MOEMS 15 (3), 031603, 2016
|Dual brush process for selective surface modification in graphoepitaxy directed self-assembly|
J Doise, BT Chan, M Hori, R Gronheid
Journal of Micro/Nanolithography, MEMS, and MOEMS 16 (3), 033503, 2017
|DSA graphoepitaxy calibrations for contact hole multiplication|
T Graves, AV Pret, S Robertson, M Smith, J Doise, J Bekaert, R Gronheid
Advances in Patterning Materials and Processes XXXII 9425, 94250Y, 2015
|Via patterning in the 7-nm node using immersion lithography and graphoepitaxy directed self-assembly|
J Doise, J Bekaert, BT Chan, M Hori, R Gronheid
Journal of Micro/Nanolithography, MEMS, and MOEMS 16 (2), 023506, 2017
|Integration of a templated directed self-assembly-based hole shrink in a short loop via chain|
P Rincon-Delgadillo, BT Chan, J Doise, M van der Veen, N Heylen, ...
Journal of Micro/Nanolithography, MEMS, and MOEMS 15 (4), 043505, 2016
|Influence of template fill in graphoepitaxy DSA|
J Doise, J Bekaert, BT Chan, SE Hong, G Lin, R Gronheid
Advances in Patterning Materials and Processes XXXIII 9779, 97791G, 2016
|Defect mitigation in sub-20nm patterning with high-chi, silicon-containing block copolymers|
J Doise, G Mannaert, HS Suh, P Rincon, JH Koh, JY Kim, Q Zhu, ...
Advances in Patterning Materials and Processes XXXVI 10960, 109600Y, 2019
|Influence of Homopolymer Addition in Templated Assembly of Cylindrical Block Copolymers|
J Doise, C Bezik, M Hori, JJ de Pablo, R Gronheid
ACS nano 13 (4), 4073-4082, 2019
|Impact of annealing temperature on DSA process: toward faster assembly kinetics (Conference Presentation)|
HS Suh, A Nair, PR Delgadillo, J Doise, G Lorusso, P Nealey, V Monreal, ...
Advances in Patterning Materials and Processes XXXV 10586, 105860T, 2018
|Studying the effects of chemistry and geometry on DSA hole-shrink process in three-dimensions|
C Zhou, T Kurosawa, T Dazai, J Doise, J Ren, C Bezik, T Segal-Peretz, ...
Journal of Micro/Nanolithography, MEMS, and MOEMS 17 (3), 031203, 2018
|Method for patterning a substrate involving directed self-assembly|
BT Chan, Z Tao, A Singh, J Doise
US Patent 9,899,220, 2018
|High-χ, Si-Containing Block Copolymers and Process Strategies for Directing Their Self-Assembly|
CJ Ellison, CG Willson, D Janes, G Blachut, Y Soymeya, PAR Delgadillo, ...
Journal of Photopolymer Science and Technology 30 (2), 187-190, 2017