| Thermal Atomic Layer Etching of SiO2 by a “Conversion-Etch” Mechanism Using Sequential Reactions of Trimethylaluminum and Hydrogen Fluoride JW DuMont, AE Marquardt, AM Cano, SM George ACS applied materials & interfaces 9 (11), 10296-10307, 2017 | 130 | 2017 |
| Trimethylaluminum as the Metal Precursor for the Atomic Layer Etching of Al2O3 Using Sequential, Self-Limiting Thermal Reactions Y Lee, JW DuMont, SM George Chemistry of Materials 28 (9), 2994-3003, 2016 | 118 | 2016 |
| Atomic layer etching of HfO2 using sequential, self-limiting thermal reactions with Sn (acac) 2 and HF Y Lee, JW DuMont, SM George ECS Journal of Solid State Science and Technology 4 (6), N5013, 2015 | 85 | 2015 |
| Atomic Layer Deposition of AlF3 Using Trimethylaluminum and Hydrogen Fluoride Y Lee, JW DuMont, AS Cavanagh, SM George The Journal of Physical Chemistry C 119 (25), 14185-14194, 2015 | 84 | 2015 |
| Mechanism of Thermal Al2O3 Atomic Layer Etching Using Sequential Reactions with Sn(acac)2 and HF Y Lee, JW DuMont, SM George Chemistry of Materials 27 (10), 3648-3657, 2015 | 76 | 2015 |
| Effect of HF Pressure on Thermal Al2O3 Atomic Layer Etch Rates and Al2O3 Fluorination AM Cano, AE Marquardt, JW DuMont, SM George The Journal of Physical Chemistry C 123 (16), 10346-10355, 2019 | 74 | 2019 |
| Pyrolysis of alucone molecular layer deposition films studied using in situ transmission Fourier transform infrared spectroscopy JW DuMont, SM George The Journal of Physical Chemistry C 119 (26), 14603-14612, 2015 | 67 | 2015 |
| Competition between Al2O3 atomic layer etching and AlF3 atomic layer deposition using sequential exposures of trimethylaluminum and hydrogen fluoride JW DuMont, SM George The Journal of Chemical Physics 146 (5), 2017 | 53 | 2017 |
| Atomic Layer Etching of AlF3 Using Sequential, Self-Limiting Thermal Reactions with Sn(acac)2 and Hydrogen Fluoride Y Lee, JW DuMont, SM George The Journal of Physical Chemistry C 119 (45), 25385-25393, 2015 | 44 | 2015 |
| Spatial molecular layer deposition of polyamide thin films on flexible polymer substrates using a rotating cylinder reactor DJ Higgs, JW DuMont, K Sharma, SM George Journal of Vacuum Science & Technology A 36 (1), 2018 | 29 | 2018 |
| High-energy all-solid-state lithium batteries enabled by Co-free LiNiO2 cathodes with robust outside-in structures L Wang, A Mukherjee, CY Kuo, S Chakrabarty, R Yemini, AA Dameron, ... Nature nanotechnology 19 (2), 208-218, 2024 | 6 | 2024 |
| Atomic Layer Etching (ALE) using sequential thermal reactions: Atomic Layer Deposition (ALD) in reverse S George, Y Lee, J DuMont, N Johnson, D Zywotko ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY 253, 2017 | 3 | 2017 |
| Atomic Layer Etching Using Thermal Reactions: Atomic Layer Deposition in Reverse Y Lee, JW DuMont, SM George ECS Transactions 69 (7), 233, 2015 | 3 | 2015 |
| Tantalum Oxide Coating of Ni-rich Cathode Active Material via Atomic Layer Deposition and its Influence on Gas Evolution and Electrochemical Performance in the Early and … M Dalkilic, A Schmidt, TD Schladt, P Axmann, J DuMont, J Travis, ... Journal of The Electrochemical Society 169 (11), 110537, 2022 | 1 | 2022 |
| Scaling a Gas Phase Residual Lithium Conversion Process on Ni-Rich NMC Cathode Materials in Commercial Fluidized Bed Reactors JW DuMont, M Herbert-Walters, M Martinez, D Lewis, BK Hughes, ... Electrochemical Society Meeting Abstracts 244, 1477-1477, 2023 | | 2023 |
| (Invited) Dual Coatings, Triple the Benefit; Atomic Armor for Better Battery Performance BK Hughes, M Herbert-Walters, M Martinez, N Turner, JW DuMont, ... Electrochemical Society Meeting Abstracts 244, 1481-1481, 2023 | | 2023 |
| ACTIVE MATERIAL AND ITS MANUFACTURING METHOD D Inoue, T Yamamoto, JW Dumont, AA Dameron, BK Hughes | | 2023 |
| Active Material and Process for Producing the Same D Inoue, T Yamamoto, JW Dumont, AA Dameron, BK Hughes US Patent App. 17/344,011, 2022 | | 2022 |
| (Invited) High Throughput Atomic Layer Deposition Manufacturing Processes for Improved Batteries AA Dameron, M Martinez, J Dumont, MN Herbert-Walters, AM Valceschini, ... Electrochemical Society Meeting Abstracts prime2020, 1692-1692, 2020 | | 2020 |
| Enhancement of thermal atomic layer etching SMC George, NR Johnson, JW Dumont, AE Marquardt, Y Lee, ... US Patent 10,787,744, 2020 | | 2020 |
