| Plasma deposition—Impact of ions in plasma enhanced chemical vapor deposition, plasma enhanced atomic layer deposition, and applications to area selective deposition C Vallée, M Bonvalot, S Belahcen, T Yeghoyan, M Jaffal, R Vallat, ... Journal of Vacuum Science & Technology A 38 (3), 2020 | 41 | 2020 |
| Atmospheric Plasma-Enhanced Spatial Chemical Vapor Deposition of SiO2 Using Trivinylmethoxysilane and Oxygen Plasma VH Nguyen, A Sekkat, CA Masse de la Huerta, F Zoubian, C Crivello, ... Chemistry of Materials 32 (12), 5153-5161, 2020 | 22 | 2020 |
| Control of ion energy during plasma enhanced atomic layer deposition: A new strategy for the modulation of TiN growth delay on SiO2 S Belahcen, C Vallée, A Bsiesy, A Chaker, M Jaffal, T Yeghoyan, ... Journal of Vacuum Science & Technology A 39 (1), 2021 | 9 | 2021 |
| Area selective deposition using alternate deposition and etch super-cycle strategies M Bonvalot, C Vallée, C Mannequin, M Jaffal, R Gassilloud, N Possémé, ... Dalton Transactions 51 (2), 442-450, 2022 | 8 | 2022 |
| Low temperature topographically selective deposition by plasma enhanced atomic layer deposition with ion bombardment assistance T Yeghoyan, V Pesce, M Jaffal, G Lefevre, R Gassilloud, N Posseme, ... Journal of Vacuum Science & Technology A 39 (3), 2021 | 5 | 2021 |
| Topographical selective deposition: A comparison between plasma-enhanced atomic layer deposition/sputtering and plasma-enhanced atomic layer deposition/quasi-atomic layer … M Jaffal, T Yeghoyan, G Lefèvre, R Gassilloud, N Possémé, C Vallée, ... Journal of Vacuum Science & Technology A 39 (3), 2021 | 2 | 2021 |
| Atomic and Molecular Layer Deposition Area Selective Deposition using alternate deposition and etch super-cycle strategies. M Bonvalot, C Vallee, C Mannequin, M Jaffal, R Gassilloud, N Posseme, ... Dalton Transactions, 2021 | | 2021 |
| New insight into vertical topographical selective deposition of tantalum oxide Ta2O5 by morphological analyses G Lefevre, M Jaffal, T Yeghoyan, R Gassilloud, N Posseme, C Vallee, ... Advanced Nanomaterials Congress 2021, 2021 | | 2021 |
| Topographic Selective Deposition (TSD) by Combining Plasma Enhanced Atomic Layer Deposition and Atomic Layer Etching Processes M Jaffal, G Lefevre, T Yeghoyan, T Chevolleau, R Gassilloud, N Posseme ... ALD/ALE 2021 Virtual Meeting Overview - ALD 2021 - AVS, 2021 | | 2021 |
| Selective patterning using deposition and etch: case of area selective deposition M Bonvalot, T Yeghoyan, M Jaffal, N Posseme, R Gassilloud, ... Advanced Etch Technology and Process Integration for Nanopatterning X 11615 …, 2021 | | 2021 |
| New strategy for topographically selective deposition by low Temperature ion-assisted PE-ALD M Bonvalot, T Yeghoyan, M Jaffal, T Chevolleau, C Vallée 5th Area Selective Deposition Workshop (ASD 2021), 2021 | | 2021 |
| Origin of fluorine cross-contamination in the Topographically Selective Deposition of Ta2O5 using super-cycles of PEALD and Quasi-ALE M Jaffal, G Scoggin, G Lefevre, R Gassilloud, N Posseme, M Bonvalot 7ème edition du colloque RAFALD, 2021 | | 2021 |
| Selective patterning using deposition and etch: case of area selective deposition C Vallee, M Bonvalot, T Yeghoyan, M Jaffal, N Posseme, R Gassilloud, ... Advanced Etch Technology and Process Integration for Nanopatterning X (SPIE …, 2021 | | 2021 |
| High k Dielectrics for MIM Architecture: From Capacitors to Non-volatile Memories Applications C Vallée, P Gonon, W Jeona, M Saadi, C Mannequin, T Wakrim, C Nail, ... ICMCTF 2021-47th International Conference On Metallurgical Coatings & Thin Films, 2021 | | 2021 |
| Top and Bottom Ta2O5 Topographical Selective Deposition on 3D structures by Plasma Enhanced Atomic Layer Deposition T Yeghoyan, M Jaffal, V Pesce, G Lefevre, A Chaker, S David, ... 7th International Atomic Layer Etching Workshop (ALE 2020), 2020 | | 2020 |
| Elaboration Strategies for Topographically Selective Deposition (TSD) on 3D structures T Yeghoyan, M Jaffal, G Lefèvre, G Rémi, N Posseme, M Bonvalot, ... 5th Area Selective Deposition Workshop (ASD 2020), 2020 | | 2020 |
| Topographic Area Selective Deposition (TSD): a comparison between PEALD/q-ALE and PEALD/sputtering approaches M Jaffal, T Yeghoyan, V Pesce, G Lefevre, A Chaker, S David, ... 7th International Atomic Layer Etching Workshop (ALE 2020), 2020 | | 2020 |
| Optimization of a Topographic Selective Deposition (TSD) route by a super-cycle Atomic Layer Disposition (ALD)/Atomic Layer Etching (ALE) M Jaffal, T Yeghoyan, G Lefevre, T Chevolleau, R Gassilloud, N Posseme, ... 6 ème Workshop RAFALD 2020, 2020 | | 2020 |
| Chemically Selective Deposition of TiN by Ion-Assistance during Plasma Enhanced Atomic Layer Deposition M JAFFAL , YEGHOYAN Taguhi, BELAHCEN Samia, PESCE Vincent, BONVALOT ... 29th Materials for Advanced Metallization, 2020 | | 2020 |
| In-situ stripping of native SiO2 for Area Selective Deposition (ASD) of TiN during Plasma Atomic Layer Deposition (PEALD) T Yeghoyan, V Pesce, G Lefèvre, S Belahcen, M Jaffal, R Gassilloud, ... RAFALD 2019, 2019 | | 2019 |
