Bei Yu
Title
Cited by
Cited by
Year
Layout decomposition for triple patterning lithography
B Yu, K Yuan, D Ding, DZ Pan
IEEE Transactions on Computer-Aided Design of Integrated Circuits and …, 2015
1692015
Recent advances in convolutional neural network acceleration
Q Zhang, M Zhang, T Chen, Z Sun, Y Ma, B Yu
Neurocomputing 323, 37-51, 2019
1442019
Provably secure camouflaging strategy for IC protection
M Li, K Shamsi, T Meade, Z Zhao, B Yu, Y Jin, DZ Pan
IEEE transactions on computer-aided design of integrated circuits and …, 2017
1352017
Design for manufacturing with emerging nanolithography
DZ Pan, B Yu, JR Gao
IEEE Transactions on Computer-Aided Design of Integrated Circuits and …, 2013
942013
Layout hotspot detection with feature tensor generation and deep biased learning
H Yang, J Su, Y Zou, Y Ma, B Yu, EFY Young
IEEE Transactions on Computer-Aided Design of Integrated Circuits and …, 2018
812018
EPIC: Efficient prediction of IC manufacturing hotspots with a unified meta-classification formulation
D Ding, B Yu, J Ghosh, DZ Pan
17th Asia and South Pacific Design Automation Conference, 263-270, 2012
792012
Methodology for standard cell compliance and detailed placement for triple patterning lithography
B Yu, X Xu, JR Gao, Y Lin, Z Li, CJ Alpert, DZ Pan
IEEE Transactions on Computer-Aided Design of Integrated Circuits and …, 2015
742015
Self-aligned double patterning aware pin access and standard cell layout co-optimization
X Xu, B Cline, G Yeric, B Yu, DZ Pan
IEEE Transactions on Computer-Aided Design of Integrated Circuits and …, 2015
712015
Imbalance aware lithography hotspot detection: a deep learning approach
H Yang, L Luo, J Su, C Lin, B Yu
Journal of Micro/Nanolithography, MEMS, and MOEMS 16 (3), 033504, 2017
702017
A new lithography hotspot detection framework based on AdaBoost classifier and simplified feature extraction
T Matsunawa, JR Gao, B Yu, DZ Pan
Design-Process-Technology Co-optimization for Manufacturability IX 9427, 94270S, 2015
672015
Optical proximity correction with hierarchical bayes model
T Matsunawa, B Yu, DZ Pan
Journal of Micro/Nanolithography, MEMS, and MOEMS 15 (2), 021009, 2016
652016
Enabling online learning in lithography hotspot detection with information-theoretic feature optimization
H Zhang, B Yu, EFY Young
Proceedings of the 35th International Conference on Computer-Aided Design, 1-8, 2016
642016
GAN-OPC: Mask optimization with lithography-guided generative adversarial nets
H Yang, S Li, Z Deng, Y Ma, B Yu, EFY Young
IEEE Transactions on Computer-Aided Design of Integrated Circuits and …, 2019
632019
PARR: Pin-access planning and regular routing for self-aligned double patterning
X Xu, B Yu, JR Gao, CL Hsu, DZ Pan
ACM Transactions on Design Automation of Electronic Systems (TODAES) 21 (3 …, 2016
602016
A high-performance triple patterning layout decomposer with balanced density
B Yu, YH Lin, G Luk-Pat, D Ding, K Lucas, DZ Pan
2013 IEEE/ACM International Conference on Computer-Aided Design (ICCAD), 163-169, 2013
602013
Implications of triple patterning for 14nm node design and patterning
K Lucas, C Cork, B Yu, G Luk-Pat, B Painter, DZ Pan
Design for Manufacturability through Design-Process Integration VI 8327, 832703, 2012
552012
MrDP: Multiple-row detailed placement of heterogeneous-sized cells for advanced nodes
Y Lin, B Yu, X Xu, JR Gao, N Viswanathan, WH Liu, Z Li, CJ Alpert, ...
IEEE Transactions on Computer-Aided Design of Integrated Circuits and …, 2017
492017
Standard cell layout regularity and pin access optimization considering middle-of-line
W Ye, B Yu, DZO Pan, YC Ban, L Liebmann
Proceedings of the 25th edition on Great Lakes Symposium on VLSI, 289-294, 2015
482015
Machine Learning and Pattern Matching in Physical Design
B Yu, DZ Pan, T Matsunawa, X Zeng
IEEE/ACM Asian and South Pacific Design Automation Conference (ASPDAC), 2015
482015
TRIAD: A triple patterning lithography aware detailed router
YH Lin, B Yu, DZ Pan, YL Li
Proceedings of the International Conference on Computer-Aided Design, 123-129, 2012
482012
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Articles 1–20