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Mohamad Blend
Mohamad Blend
CEA-Leti
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Year
Normally-OFF 650V GaN-on-Si MOSc-HEMT transistor: benefits of the fully recessed gate architecture
C Le Royer, B Mohamad, J Biscarrat, L Vauche, R Escoffier, J Buckley, ...
2022 IEEE 34th International Symposium on Power Semiconductor Devices and …, 2022
192022
Full Front and Back Split CV characterization of CMOS devices from 14nm node FDSOI technology
B Mohamad, G Ghibaudo, C Leroux, E Josse, G Reimbold
2015 IEEE SOI-3D-Subthreshold Microelectronics Technology Unified Conference …, 2015
142015
Impact of post-deposition anneal on ALD Al2O3/etched GaN interface for gate-first MOSc-HEMT
PFPP Rocha, L Vauche, B Mohamad, W Vandendaele, E Martinez, ...
Power Electronic Devices and Components 4, 100033, 2023
82023
A comprehensive analysis of AlN spacer and AlGaN n-doping effects on the 2DEG resistance in AlGaN/AlN/GaN heterostructures
C Piotrowicz, B Mohamad, B Rrustemi, N Malbert, MA Jaud, ...
Solid-State Electronics 194, 108322, 2022
82022
Determination of well flat band condition in thin film FDSOI transistors using CV measurement for accurate parameter extraction
B Mohamad, C Leroux, G Reimbold, G Ghibaudo
Solid-State Electronics 139, 88-93, 2018
42018
Impact of Gate Morphology on Electrical Performances of Recessed GaN-on Si MOS channel-HEMT for Different Channel Orientations
C Piotrowic, B Mohamad, PFPP Rocha, N Malbert, S Ruel, ...
2023 35th International Symposium on Power Semiconductor Devices and ICs …, 2023
32023
Drain voltage impact on charge redistribution in GaN-on-Si E-mode MOSc-HEMTs
C Leurquin, W Vandendaele, R Gwoziecki, B Mohamad, G Despesse, ...
2023 IEEE International Reliability Physics Symposium (IRPS), 1-6, 2023
32023
Influence of AlGaN n-type doping and AlN thickness on the two-dimensional electron gas density (ns) and resistance (R2DEG)
C Piotrowicz, B Mohamad, N Malbert, MA Jaud, W Vandendaele, ...
Solid-State Electronics 201, 108594, 2023
32023
Role of free holes in nBTI degradation in GaN-on-Si MOS-channel HEMTs
W Vandendaele, MA Jaud, AG Viey, B Mohamad, C Le Royer, L Vauche, ...
2022 IEEE 34th International Symposium on Power Semiconductor Devices and …, 2022
32022
Electrical characterization of fully depleted SOI devices based on CV measurements
B Mohamad
Université Grenoble Alpes (ComUE), 2017
32017
Reliable gate stack and substrate parameter extraction based on CV measurements for 14 nm node FDSOI technology
B Mohamad, C Leroux, D Rideau, M Haond, G Reimbold, G Ghibaudo
Solid-State Electronics 128, 10-16, 2017
32017
Robust EOT and effective work function extraction for 14 nm node FDSOI technology
B Mohamad, C Leroux, D Rideau, M Haond, G Reimbold, G Ghibaudo
2016 Joint International EUROSOI Workshop and International Conference on …, 2016
32016
Reliability of GaN MOSc-HEMTs: From TDDB to Threshold Voltage Instabilities
W Vandendaele, C Leurquin, R Lavieville, MA Jaud, AG Viey, ...
2023 IEEE International Reliability Physics Symposium (IRPS), 1-8, 2023
22023
Effect of doping on Al2O3/GaN MOS capacitance
B Rrustemi, C Piotrowicz, MA Jaud, F Triozon, W Vandendaele, ...
Solid-State Electronics 194, 108356, 2022
22022
Effect of La and Al addition used for threshold voltage shift on the BTI reliability of HfON-based FDSOI MOSFETs
P Kumar, C Leroux, B Mohamad, A Toffoli, G Romano, X Garros, ...
2017 IEEE International Reliability Physics Symposium (IRPS), 2B-2.1-2B-2.7, 2017
22017
Post-deposition annealing challenges for ALD Al0. 5Si0. 5Ox/n-GaN MOS devices
PFPP Rocha, L Vauche, M Bedjaoui, S Cadot, B Mohamad, ...
Solid-State Electronics 209, 108780, 2023
12023
Electronic device comprising transistors
R Escoffier, B Mohamad
US Patent App. 17/826,706, 2022
12022
Recent advances in GaN power devices development at CEA-LETI
R Gwoziecki, J Buckley, C Le Royer, L Vauche, B Mohamad, C Gillot, ...
GaN Marathon, 2022
12022
Impact of Post-Deposition Anneal on ALD Al2O3/etched GaN Interface in Gate-First MOSc-HEMT Process Flow
PFPP Rocha, L Vauche, B Mohamad, W Vandendaele, E Martinez, ...
GaN Marathon, 2022
12022
Mobility Extraction Using Improved Resistance Partitioning Methodology for Normally-OFF Fully Vertical GaN Trench MOSFETs
V Ackermann, B Mohamad, H El Rammouz, V Maurya, E Frayssinet, ...
Electronics 13 (12), 2350, 2024
2024
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