| Mott-transition-based RRAM Y Wang, KM Kang, M Kim, HS Lee, R Waser, D Wouters, R Dittmann, ... Materials today 28, 63-80, 2019 | 70 | 2019 |
| Anion-controlled passivation effect of the atomic layer deposited ZnO films by F substitution to O-related defects on the electronic band structure for transparent contact … YJ Choi, KM Kang, HH Park Solar Energy Materials and Solar Cells 132, 403-409, 2015 | 58 | 2015 |
| Al/F codoping effect on the structural, electrical, and optical properties of ZnO films grown via atomic layer deposition KM Kang, Y Wang, M Kim, C Lee, HH Park Applied Surface Science 535, 147734, 2021 | 27 | 2021 |
| Study on properties of Ga/F-co-doped ZnO thin films prepared using atomic layer deposition KM Kang, Y Wang, M Kim, HH Park Thin Solid Films 660, 913-919, 2018 | 26 | 2018 |
| Effect of atomic layer deposition temperature on the growth orientation, morphology, and electrical, optical, and band-structural properties of ZnO and fluorine-doped ZnO thin … KM Kang, HH Park The Journal of Physical Chemistry C 122 (1), 377-385, 2018 | 26 | 2018 |
| Non-laminated growth of chlorine-doped zinc oxide films by atomic layer deposition at low temperatures YJ Choi, KM Kang, HS Lee, HH Park Journal of Materials Chemistry C 3 (32), 8336-8343, 2015 | 24 | 2015 |
| N-doped Al2O3 thin films deposited by atomic layer deposition M Kim, KM Kang, Y Wang, HH Park Thin Solid Films 660, 657-662, 2018 | 22 | 2018 |
| The CO gas sensing properties of direct-patternable SnO 2 films containing graphene or Ag nanoparticles H Kim, CS Park, KM Kang, MH Hong, YJ Choi, HH Park New Journal of Chemistry 39 (3), 2256-2260, 2015 | 22 | 2015 |
| Oxygen vacancy-passivated ZnO thin film formed by atomic layer deposition using H2O2 Y Wang, KM Kang, M Kim, HH Park Journal of Vacuum Science & Technology A 36 (3), 2018 | 19 | 2018 |
| Low temperature method to passivate oxygen vacancies in un-doped ZnO films using atomic layer deposition Y Wang, KM Kang, M Kim, HH Park Thin Solid Films 660, 852-858, 2018 | 17 | 2018 |
| The role of oxygen defects engineering via passivation of the Al2O3 interfacial layer for the direct growth of a graphene-silicon Schottky junction solar cell M Kim, MA Rehman, KM Kang, Y Wang, S Park, HS Lee, SB Roy, ... Applied Materials Today 26, 101267, 2022 | 15 | 2022 |
| Film thickness effect in c-axis oxygen vacancy-passivated ZnO prepared via atomic layer deposition by using H2O2 Y Wang, KM Kang, M Kim, HH Park Applied Surface Science 529, 147095, 2020 | 13 | 2020 |
| Thickness-dependent growth orientation of F-doped ZnO films formed by atomic layer deposition KM Kang, YJ Choi, GY Yeom, HH Park Journal of Vacuum Science & Technology A 34 (1), 2016 | 12 | 2016 |
| Electromagnetic interference shielding behaviors of Zn-based conducting oxide films prepared by atomic layer deposition YJ Choi, KM Kang, HS Lee, HH Park Thin Solid Films 583, 226-232, 2015 | 12 | 2015 |
| Enhanced hole injection into indium-free organic red light-emitting diodes by fluorine-doping-induced texturing of a zinc oxide surface YJ Choi, SC Gong, KM Kang, HH Park Journal of Materials Chemistry C 2 (39), 8344-8349, 2014 | 12 | 2014 |
| Structural, electrical, and optical properties of Si-doped ZnO thin films prepared via supercycled atomic layer deposition C Hong, KM Kang, M Kim, Y Wang, T Kim, C Lee, HH Park Materials Science and Engineering: B 273, 115401, 2021 | 11 | 2021 |
| Structural, electrical, and optical properties of photochemical metal-organic-deposited ZnO thin films incorporated with Ag nanoparticles and graphene KM Kang, YJ Choi, H Kim, HH Park ECS Journal of Solid State Science and Technology 4 (7), N55, 2015 | 7 | 2015 |
| Homogeneous ZnO pn junction formed by continuous atomic layer deposition process KM Kang, C Lee, M Kim, H Choi, D Kim, SR Kim, JW Park, HH Park Journal of Alloys and Compounds 925, 166694, 2022 | 5 | 2022 |
| Directly patternable SnO2 thin films incorporating Pt nanoparticles H Kim, YJ Choi, KM Kang, HH Park Materials Research Bulletin 52, 6-10, 2014 | 5 | 2014 |
| Effective oxygen-defect passivation in ZnO thin films prepared by atomic layer deposition using hydrogen peroxide Y Wang, KM Kang, M Kim, HH Park, Y Wang, KM Kang, M Kim, HH Park Journal of the Korean Ceramic Society 56 (3), 302-307, 2019 | 4 | 2019 |
Yong-June ChoiSAMSUNG Electronics / Yonsei University在 yonsei.ac.kr 的电子邮件经过验证
