| Radical probe system for in situ measurements of radical densities of hydrogen, oxygen, and nitrogen D Qerimi, I Shchelkanov, G Panici, A Jain, J Wagner, DN Ruzic Journal of Vacuum Science & Technology A 39 (2), 2021 | 12 | 2021 |
| Study of a linear surface wave plasma source for tin removal in an extreme ultraviolet source D Qerimi, G Panici, A Jain, D Jacobson, DN Ruzic Journal of Vacuum Science & Technology B 38 (5), 2020 | 11 | 2020 |
| Study of Sn removal by surface wave plasma for source cleaning G Panici, D Qerimi, DN Ruzic Extreme Ultraviolet (EUV) Lithography VIII 10143, 522-529, 2017 | 6 | 2017 |
| Tin removal by an annular surface wave plasma antenna in an extreme ultraviolet lithography source D Qerimi, AC Herschberg, G Panici, P Hays, T Pohlman, DN Ruzic Journal of Applied Physics 132 (11), 2022 | 5 | 2022 |
| Determination of recombination coefficients for hydrogen, oxygen, and nitrogen gasses via in situ radical probe system D Qerimi, G Panici, A Jain, D Jacobson, DN Ruzic Journal of Vacuum Science & Technology A 39 (2), 2021 | 5 | 2021 |
| Modeling Sn scattering through hydrogen using DFT potentials J Stahl, D Qerimi, N Braaksma, P Mayer, D Brandt, DN Ruzic Extreme Ultraviolet (EUV) Lithography XII 11609, 116091R, 2021 | 1 | 2021 |
| Ongoing investigation of collector cleaning by surface wave plasma in the Illinois NXE: 3100 chamber GA Panici, D Qerimi, DN Ruzic Extreme Ultraviolet (EUV) Lithography X 10957, 109571B, 2019 | 1 | 2019 |
| Study of Sn removal by surface wave plasma for source cleaning (Conference Presentation) GA Panici, D Qerimi, DN Ruzic Extreme Ultraviolet (EUV) Lithography IX 10583, 105831A, 2018 | 1 | 2018 |
| Tin removal by annular surface wave plasma antenna in an extreme ultraviolet source D Qerimi, AC Herschberg, P Hays, T Pohlman, DN Ruzic Optical and EUV Nanolithography XXXV, PC120510Y, 2022 | | 2022 |
| Tin etching in an EUV source by inherent and surface wave plasma D Qerimi University of Illinois at Urbana-Champaign, 2022 | | 2022 |
| Single Electrode AC Plasma Anemometer in High Speed H2 Jet With Background RF Plasma EH Matlis, TC Corke, D Qerimi, D Ruzic AIAA AVIATION 2022 Forum, 3364, 2022 | | 2022 |
| Influence of temperature, hydrogen ions, and hydrogen radicals on Sn etching D Qerimi, G Panici, J Stahl, F Li, N Braaksma, I Fomenkov, D Brandt, ... Extreme Ultraviolet (EUV) Lithography XII 11609, 116091A, 2021 | | 2021 |
| Study of ion enhanced Sn removal by surface wave plasma for source cleaning (Conference Presentation) DN Ruzic, GA Panici, D Qerimi International Conference on Extreme Ultraviolet Lithography 2017 10450, 1045013, 2017 | | 2017 |
| Modeling Tin Scattering Through Hydrogen Using Density-Functional Theory J Stahl, D Qerimi, N Braaksma, P Mayer, D Brandt, DN Ruzic | | |
