Follow
Ravi kiran Chityala
Title
Cited by
Cited by
Year
Vertical etching of scandium aluminum nitride thin films using TMAH solution
ASMZ Shifat, I Stricklin, RK Chityala, A Aryal, G Esteves, A Siddiqui, ...
Nanomaterials 13 (2), 274, 2023
232023
Nanoplasmonic concurrent dual band antennas using metal‐insulator‐metal step impedance resonators
RK Chityala
Microwave and Optical Technology Letters 61 (6), 1598-1601, 2019
102019
Concurrent dualband nanoplasmonic MIM slot waveguide based directional Coupler
RK Chityala, VK Chandubatla
International Journal of Electrical and Electronics Research 7 (1), 217-219, 2019
42019
Realization of high-Q Lamb wave resonator with smooth vertical etching profile for thin film lithium niobate
A Aryal, RK Chityala, I Stricklin, S Tiwari, A Siddiqui, T Busani
Novel Patterning Technologies 2023 12497, 261-264, 2023
22023
Etching of scandium-doped aluminum nitride using inductively coupled plasma dry etch and tetramethyl ammonium hydroxide
ASMZ Shifat, I Stricklin, RK Chityala, A Aryal, G Esteves, A Siddiqui, ...
MRS Advances 8 (16), 871-877, 2023
12023
Deep smooth etching to realize scalable devices having piezoelectric crystals
T Busani, A Aryal, AM Siddiqui, M Behzadirad, RK Chityala, ASMDZ Shifat, ...
US Patent App. 18/298,790, 2023
12023
Design and Characterization of High-Q Micro-Ring Resonator using X-Cut LNOI
RK Chityala, A Aryal, S Madras, M Gehl, A Siddiqui, T Busani
CLEO: Science and Innovations, JW2A. 133, 2023
12023
Inattentive HF Concentration Vapors Phase Release of Micro-electro-mechanical Systems and Optical Systems
T Busani, RK Chityala
US Patent App. 18/496,823, 2024
2024
High-Accuracy Prediction of ScAlN Thin Film Dry Etching Using Machine Learning Driven Regression Modeling
ASMDZ Shifat, R Jaiswal, RK Chityala, A Siddiqui, M Martinez-Ramon, ...
ACS Applied Electronic Materials, 2024
2024
Design and analysis of dual‐band plasmonic band pass filter using meandering step impedance resonator
RK Chityala, A Aryal, P Osman, PV Sridevi, Y Chityala
Microwave and Optical Technology Letters 66 (1), e34009, 2024
2024
Vertical Etching of Scandium Aluminum Nitride Thin Films Using TMAH Solution. Nanomaterials 2023, 13, 274
A Shifat, I Stricklin, RK Chityala, A Aryal, G Esteves, A Siddiqui, T Busani
2023
The system can't perform the operation now. Try again later.
Articles 1–11