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Enrico Brusaterra
Enrico Brusaterra
Ferdinand Braun Institut (FBH)
Verified email at FBH-Berlin.de
Title
Cited by
Cited by
Year
Logarithmic trapping and detrapping in β-Ga2O3 MOSFETs: Experimental analysis and modeling
M Fregolent, E Brusaterra, C De Santi, K Tetzner, J Würfl, G Meneghesso, ...
Applied Physics Letters 120 (16), 2022
122022
Optimization of vertical GaN drift region layers for avalanche and punch-through pn-diodes
E Brusaterra, EB Treidel, F Brunner, M Wolf, A Thies, J Würfl, O Hilt
IEEE Electron Device Letters 44 (3), 388-391, 2023
102023
Effects of post metallization annealing on Al2O3 atomic layer deposition on n-GaN
L Tadmor, E Brusaterra, EB Treidel, F Brunner, N Bickel, ...
Semiconductor Science and Technology 38 (1), 015006, 2022
72022
Review on the degradation of GaN-based lateral power transistors
C De Santi, M Buffolo, I Rossetto, T Bordignon, E Brusaterra, A Caria, ...
e-Prime-Advances in Electrical Engineering, Electronics and Energy 1, 100018, 2021
72021
Conduction properties and threshold voltage instability in β-Ga2O3 MOSFETs
M Fregolent, E Brusaterra, C De Santi, K Tetzner, J Würfl, G Meneghesso, ...
Oxide-based Materials and Devices XIII 12002, 40-45, 2022
32022
Gate leakage modeling in lateral β-Ga2O3 MOSFETs with Al2O3 gate dielectric
M Fregolent, E Brusaterra, C De Santi, K Tetzner, J Würfl, G Meneghesso, ...
Applied Physics Letters 123 (10), 2023
22023
Investigation of atomic layer deposition methods of Al2O3 on n-GaN
L Tadmor, SST Vandenbroucke, E Bahat Treidel, E Brusaterra, P Plate, ...
Journal of Applied Physics 135 (8), 2024
12024
Correlating Interface and Border Traps With Distinctive Features of CV Curves in Vertical AlO/GaN MOS Capacitors
N Zagni, M Fregolent, G Verzellesi, A Marcuzzi, C De Santi, ...
IEEE Transactions on Electron Devices, 2023
12023
Importance of Scaling in RF GaN HEMTs for Reduction of Surface Traps‐Induced Drain Lag
H Yazdani, C Zervos, P Beleniotis, E Brusaterra, O Hilt, M Rudolph, ...
physica status solidi (a), 2300885, 2024
2024
Modeling of the gate leakage in MOSFETs with Al2O3/β-Ga2O3 gate stack
C De Santi, M Fregolent, E Brusaterra, K Tetzner, J Würfl, M Buffolo, ...
Oxide-based Materials and Devices XV 12887, 57-60, 2024
2024
Laser-lift-off of GaN-based transistors with an ultra-short-pulsed deep UV laser
L Deriks, EB Treidel, E Brandl, J Bravin, E Brusaterra, S Danylyuk
Laser Applications in Microelectronic and Optoelectronic Manufacturing …, 2024
2024
GaN Vertical Devices: challenges for high performance and stability
M Meneghini, M Fregolent, N Zagni, C DE SANTI, EB Treidel, ...
Proceedings of ICNS-14 conference, 2023
2023
In Vacuo XPS Study of Al2O3 ALD Deposition Processes on n-GaN
S Vandenbroucke, E Bahat Treidel, L Tadmor, E Brusaterra, P Plate, ...
EuroCVD-BalticALD 2023, 2023
2023
Gaudenzio Meneghesso, Enrico Zanoni and Matteo Meneghini a) Department of Information Engineering, University of Padova, Padova, Italy b) Ferdinand-Braun-Institut gGmbH …
M Fregolent, E Brusaterra, C De Santi, K Tetzner, J Würfl
Proc. of SPIE Vol 12002, 1200206-1, 2022
2022
GaN Drift Layers on Sapphire and GaN Substrates for 1.2 kV Class Vertical Power Devices
F Brunner, E Brusaterra, E Bahat‐Treidel, O Hilt, M Weyers
physica status solidi (RRL)–Rapid Research Letters, 2400013, 0
Drift Region Epitaxy Development and Characterization for High Blocking Strength and Low Specific Resistance in Vertical GaN Based Devices
EB Treidel, F Brunner, E Brusaterra, M Wolf, A Thies, J Würfl, O Hilt
Experimental characterization of Gallium Oxide lateral MOSFETs and modelling of parameter instabilities.
E BRUSATERRA
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Articles 1–17