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Andreas Werbrouck
Andreas Werbrouck
Ghent University, Stanford University, University of Missouri
Verified email at stanford.edu - Homepage
Title
Cited by
Cited by
Year
Atomic layer deposition of ZnO–SnO2 composite thin film: The influence of structure, composition and crystallinity on lithium-ion battery performance
B Zhao, F Mattelaer, J Kint, A Werbrouck, L Henderick, M Minjauw, ...
Electrochimica Acta 320, 134604, 2019
532019
In situ photoluminescence of colloidal quantum dots during gas exposure—the role of water and reactive atomic layer deposition precursors
J Kuhs, A Werbrouck, N Zawacka, E Drijvers, PF Smet, Z Hens, ...
ACS applied materials & interfaces 11 (29), 26277-26287, 2019
112019
Atomic layer deposition of metal phosphates
L Henderick, A Dhara, A Werbrouck, J Dendooven, C Detavernier
Applied Physics Reviews 9 (1), 2022
82022
Converting molecular layer deposited alucone films into Al2O3/alucone hybrid multilayers by plasma densification
JSD Peñaranda, M Nisula, SST Vandenbroucke, MM Minjauw, J Li, ...
Dalton Transactions 50 (4), 1224-1232, 2021
72021
A secondary reaction pathway for the alumina atomic layer deposition process with trimethylaluminum and water, revealed by full-range, time-resolved In Situ mass spectrometry
A Werbrouck, M Shirazi, F Mattelaer, SD Elliott, J Dendooven, ...
The Journal of Physical Chemistry C 124 (48), 26443-26454, 2020
72020
Reaction pathways for atomic layer deposition with lithium hexamethyl disilazide, trimethyl phosphate, and oxygen plasma
A Werbrouck, F Mattelaer, M Minjauw, M Nisula, J Julin, F Munnik, ...
The Journal of Physical Chemistry C 124 (50), 27829-27839, 2020
52020
Atomic Layer Deposition of Ruthenium Dioxide Based on Redox Reactions between Alcohols and Ruthenium Tetroxide
N Poonkottil, MM Minjauw, A Werbrouck, S Checchia, E Solano, M Nisula, ...
Chemistry of Materials 34 (19), 8946-8958, 2022
42022
Selective Vapor-Phase Doping of Pt Nanoparticles into Phase-Controlled Nanoalloys
N Poonkottil, RK Ramachandran, E Solano, NV Srinath, JY Feng, ...
The Journal of Physical Chemistry C 126 (3), 1426-1438, 2022
32022
Plasma-enhanced atomic layer deposition: Correlating O 2 plasma parameters and species to blister formation and conformal film growth
A Werbrouck, K Van de Kerckhove, D Depla, D Poelman, PF Smet, ...
Journal of Vacuum Science & Technology A 39 (6), 2021
32021
HfO2 Area-Selective Atomic Layer Deposition with a Carbon-Free Inhibition Layer
Y Lee, S Seo, AB Shearer, A Werbrouck, H Kim, SF Bent
Chemistry of Materials 36 (9), 4303-4314, 2024
2024
Enhanced Growth in Atomic Layer Deposition of Ruthenium Metal: The Role of Surface Diffusion and Nucleation Sites
A Rothman, A Werbrouck, SF Bent
Chemistry of Materials 36 (1), 541-550, 2023
2023
Surface reactions between LiHMDS, TMA and TMP leading to deposition of amorphous lithium phosphate
A Werbrouck, F Mattelaer, A Dhara, M Nisula, M Minjauw, F Munnik, ...
Journal of Materials Chemistry A 10 (7), 3543-3551, 2022
2022
Converting molecular layer deposited alucone films into Al2O3/alucone hybrid multilayers by plasma densification.
J Santo Domingo Peñaranda, M Nisula, SST Vandenbroucke, ...
Dalton Transactions (Cambridge, England: 2003) 50 (4), 1224-1232, 2021
2021
In and ex situ characterization of atomic layer deposition processes for lithium-ion battery applications
A Werbrouck
Ghent University, 2021
2021
Selective Vapor Phase Doping of Pt Nanoparticles into Phase-Controlled Nanoalloys--Supporting Information--
N Poonkottil, RK Ramachandran, E Solano, NV Srinath, JY Feng, ...
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