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Michael Nelhiebel
Michael Nelhiebel
KAI GmbH / Infineon Technologies Austria AG
Verified email at infineon.com
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Cited by
Year
The paradigm shift in understanding the bias temperature instability: From reaction–diffusion to switching oxide traps
T Grasser, B Kaczer, W Goes, H Reisinger, T Aichinger, P Hehenberger, ...
IEEE Transactions on Electron Devices 58 (11), 3652-3666, 2011
5132011
A two-stage model for negative bias temperature instability
T Grasser, B Kaczer, W Goes, T Aichinger, P Hehenberger, M Nelhiebel
2009 IEEE international reliability physics symposium, 33-44, 2009
2892009
Analytic modeling of the bias temperature instability using capture/emission time maps
T Grasser, PJ Wagner, H Reisinger, T Aichinger, G Pobegen, M Nelhiebel, ...
2011 International Electron Devices Meeting, 27.4. 1-27.4. 4, 2011
2172011
Switching oxide traps as the missing link between negative bias temperature instability and random telegraph noise
T Grasser, H Reisinger, W Goes, T Aichinger, P Hehenberger, PJ Wagner, ...
2009 IEEE International Electron Devices Meeting (IEDM), 1-4, 2009
1442009
Theory of orientation-sensitive near-edge fine-structure core-level spectroscopy
M Nelhiebel, PH Louf, P Schattschneider, P Blaha, K Schwarz, B Jouffrey
Physical Review B 59 (20), 12807, 1999
1431999
Recent advances in understanding the bias temperature instability
T Grasser, B Kaczer, W Goes, H Reisinger, T Aichinger, P Hehenberger, ...
2010 international electron devices meeting, 4.4. 1-4.4. 4, 2010
1322010
The ‘permanent’component of NBTI: Composition and annealing
T Grasser, T Aichinger, G Pobegen, H Reisinger, PJ Wagner, J Franco, ...
2011 International Reliability Physics Symposium, 6A. 2.1-6A. 2.9, 2011
1052011
Density matrix of inelastically scattered fast electrons
P Schattschneider, M Nelhiebel, B Jouffrey
Physical Review B 59 (16), 10959, 1999
921999
The orientation-dependent simulation of ELNES
C Hébert-Souche, PH Louf, P Blaha, M Nelhiebel, J Luitz, ...
Ultramicroscopy 83 (1-2), 9-16, 2000
882000
Orientation sensitive EELS-analysis of boron nitride nanometric hollow spheres
C Souche, B Jouffrey, G Hug, M Nelhiebel
Micron 29 (6), 419-424, 1998
771998
Understanding negative bias temperature instability in the context of hole trapping
T Grasser, B Kaczer, W Gös, T Aichinger, P Hehenberger, M Nelhiebel
Microelectronic Engineering 86 (7-9), 1876-1882, 2009
732009
The physical significance of the mixed dynamic form factor
P Schattschneider, M Nelhiebel, H Souchay, B Jouffrey
Micron 31 (4), 333-345, 2000
732000
Unambiguous identification of the NBTI recovery mechanism using ultra-fast temperature changes
T Aichinger, M Nelhiebel, T Grasser
2009 IEEE International Reliability Physics Symposium, 2-7, 2009
662009
On the temperature dependence of NBTI recovery
T Aichinger, M Nelhiebel, T Grasser
Microelectronics Reliability 48 (8-9), 1178-1184, 2008
582008
Observation of normally distributed energies for interface trap recovery after hot-carrier degradation
G Pobegen, S Tyaginov, M Nelhiebel, T Grasser
IEEE electron device letters 34 (8), 939-941, 2013
552013
A reliable technology concept for active power cycling to extreme temperatures
M Nelhiebel, R Illing, C Schreiber, S Wöhlert, S Lanzerstorfer, M Ladurner, ...
Microelectronics Reliability 51 (9-11), 1927-1932, 2011
512011
High temperature storage reliability investigation of the Al–Cu wire bond interface
R Pelzer, M Nelhiebel, R Zink, S Wöhlert, A Lassnig, G Khatibi
Microelectronics Reliability 52 (9-10), 1966-1970, 2012
472012
In Situ Poly Heater—A Reliable Tool for Performing Fast and Defined Temperature Switches on Chip
T Aichinger, M Nelhiebel, S Einspieler, T Grasser
IEEE Transactions on Device and Materials Reliability 10 (1), 3-8, 2009
462009
Understanding temperature acceleration for NBTI
G Pobegen, T Aichinger, M Nelhiebel, T Grasser
2011 International Electron Devices Meeting, 27.3. 1-27.3. 4, 2011
452011
Do NBTI-induced interface states show fast recovery? A study using a corrected on-the-fly charge-pumping measurement technique
P Hehenberger, T Aichinger, T Grasser, W Gos, O Triebl, B Kaczer, ...
2009 IEEE International Reliability Physics Symposium, 1033-1038, 2009
432009
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