| High-performance titanium oxynitride thin films for electrocatalytic water oxidation NR Mucha, J Som, J Choi, S Shaji, RK Gupta, HM Meyer, CL Cramer, ... ACS Applied Energy Materials 3 (9), 8366-8374, 2020 | 36 | 2020 |
| Electrical and optical properties of titanium oxynitride thin films NR Mucha, J Som, S Shaji, S Fialkova, PR Apte, B Balasubramanian, ... Journal of materials science 55, 5123-5134, 2020 | 36 | 2020 |
| Effect of substrate-induced lattice strain on the electrochemical properties of pulsed laser deposited nickel oxide thin film J Som, J Choi, H Zhang, NR Mucha, S Fialkova, K Mensah-Darkwa, ... Materials Science and Engineering: B 280, 115711, 2022 | 18 | 2022 |
| Modulation of Structural, Electronic, and Optical Properties of Titanium Nitride Thin Films by Regulated In Situ Oxidation M Roy, K Sarkar, J Som, MA Pfeifer, V Craciun, JD Schall, ... ACS Applied Materials & Interfaces 15 (3), 4733-4742, 2023 | 6 | 2023 |
| Effect of Substrate Temperature on the Electrochemical and Supercapacitance Properties of Pulsed Laser-Deposited Titanium Oxynitride Thin Films D Kumar, I Chris-Okoro, J Som, S Cherono, M Liu, S Nalawade, X Lu, ... Journal of Electrochemical Energy Conversion and Storage, 1-24, 2024 | | 2024 |
| Effects of Temperature on Ruthenium Oxide Thin Films using Pulsed Laser Deposition B Smith, T Royal, J Som, D Kumar | | 2023 |
| Magnetic and magnetocaloric properties of iron nanoparticle and iron thin films embedded or sandwiched between titanium nitride thin films K Sarkar, A Odusanya, M Roy, J Som, V Jones, A Kebede, S Kriske, ... APS March Meeting Abstracts 2023, SS01. 062, 2023 | | 2023 |
| Titanium Oxynitride Thin Film Supercapacitor Decorated with Ruthenium Oxide Nanoparticles J Som, B Smith, A Odusanya, S Bhardwaj, T Royal, J Wright, R Gupta, ... APS March Meeting Abstracts 2023, K45. 004, 2023 | | 2023 |
| Roles of Transition Metal Oxide-Oxynitride Thin Film Electrocatalyst in Water Splitting Reactions J Som North Carolina Agricultural and Technical State University, 2022 | | 2022 |
Nikhil Reddy MuchaProcess TD and Integration Engineer at Intel CorporationVerified email at intel.com
