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Jiayi Wang
Jiayi Wang
Institute of Microelectronics of The Chinese Academy of Science
Verified email at ime.ac.cn
Title
Cited by
Cited by
Year
Synthesis and characterization of the atomic laminate Mn2AlB2
S Kota, Y Chen, J Wang, SJ May, M Radovic, MW Barsoum
Journal of the European Ceramic Society 38 (16), 5333-5340, 2018
692018
Distinguishing thermal and electronic effects in ultrafast optical spectroscopy using oxide heterostructures
SY Smolin, AK Choquette, J Wang, SJ May, JB Baxter
The Journal of Physical Chemistry C 122 (1), 115-123, 2018
312018
Effect of fluoropolymer composition on topochemical synthesis of oxyfluoride films
J Wang, Y Shin, E Arenholz, BM Lefler, JM Rondinelli, SJ May
Physical Review Materials 2 (7), 073407, 2018
272018
Effect of texturing on thermal, electric and elastic properties of MoAlB, Fe2AlB2, and Mn2AlB2
S Kota, MT Agne, K Imasato, TA El-Melegy, J Wang, C Opagiste, Y Chen, ...
Journal of the European Ceramic Society 42 (7), 3183-3191, 2022
192022
Strain-induced anion-site occupancy in perovskite oxyfluoride films
J Wang, Y Shin, JR Paudel, JD Grassi, RK Sah, W Yang, E Karapetrova, ...
Chemistry of Materials 33 (5), 1811-1820, 2021
132021
Reconfigurable lateral anionic heterostructures in oxide thin films via lithographically defined topochemistry
BM Lefler, T Duchoň, G Karapetrov, J Wang, CM Schneider, SJ May
Physical review materials 3 (7), 073802, 2019
122019
Physical properties of epitaxial SrMnO2. 5− δFγ oxyfluoride films
J Wang, Y Shin, N Gauquelin, Y Yang, C Lee, D Jannis, J Verbeeck, ...
Journal of Physics: Condensed Matter 31 (36), 365602, 2019
102019
Synthesis and Characterization of SrFexMn1–x(O,F)3−δ Oxide (δ = 0 and 0.5) and Oxyfluoride Perovskite Films
J Wang, BM Lefler, SJ May
Inorganic Chemistry 59 (14), 9990-9997, 2020
82020
Study of defects distribution in SiO2/SiC with plasma oxidation and post oxidation annealing
Q Zhang, N You, P Liu, J Wang, Y Xu, S Wang
Applied Surface Science 610, 155500, 2023
32023
Oxygen diffusion kinetics during SiO2/SiC plasma oxidation
N You, X Liu, Q Zhang, Y Xu, J Wang, S Wang
Vacuum 207, 111689, 2023
32023
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