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Shy-Jay Lin
Shy-Jay Lin
Senior program manger, tsmc
Verified email at tsmc.com
Title
Cited by
Cited by
Year
Method for proximity correction
JJ Shin, SJ Lin, HT Lin, BJ Lin
US Patent 8,762,900, 2014
1112014
Devices and methods for improved reflective electron beam lithography
CH Yu, JJ Shin, SJ Lin, BJ Lin
US Patent 8,722,286, 2014
752014
MRAM device and method for fabricating the same
SH Huang, W Hung-Cho, KH Shen, SJ Lin
US Patent 10,038,137, 2018
692018
Apparatus and method of inspecting phase shift masks using comparison of a mask die image to the mask image database
SD Tzu, SJ Lin
US Patent 6,134,014, 2000
442000
Accelerating deep neural networks in processing-in-memory platforms: Analog or digital approach?
S Angizi, Z He, D Reis, XS Hu, W Tsai, SJ Lin, D Fan
2019 IEEE Computer Society Annual Symposium on VLSI (ISVLSI), 197-202, 2019
402019
Multiple-grid exposure method
WC Wang, SJ Lin, PY Liu, JJ Shin, BJ Lin
US Patent 8,530,121, 2013
372013
Toward 100% spin–orbit torque efficiency with high spin–orbital hall conductivity Pt–Cr alloys
CY Hu, YF Chiu, CC Tsai, CC Huang, KH Chen, CW Peng, CM Lee, ...
ACS Applied Electronic Materials 4 (3), 1099-1108, 2022
292022
Non-directional dithering methods
PY Liu, SJ Lin, WC Wang, JJ Shin, BJ Lin
US Patent 8,584,057, 2013
292013
Grid refinement method
WC Wang, SJ Lin, PY Liu, JJ Shin, BJ Lin
US Patent 8,822,106, 2014
282014
Observation of anti-damping spin–orbit torques generated by in-plane and out-of-plane spin polarizations in MnPd3
M Dc, DF Shao, VDH Hou, A Vailionis, P Quarterman, A Habiboglu, ...
Nature Materials 22 (5), 591-598, 2023
272023
Error diffusion and grid shift in lithography
PY Liu, SJ Lin, WC Wang, JJ Shin, BJ Lin
US Patent 8,510,687, 2013
272013
Electron beam lithography system and method for improving throughput
JJ Shin, SJ Lin, WC Wang, BJ Lin
US Patent 8,524,427, 2013
262013
Large and robust charge-to-spin conversion in sputtered conductive WTex with disorder
X Li, P Li, VDH Hou, DC Mahendra, CH Nien, F Xue, D Yi, C Bi, CM Lee, ...
Matter 4 (5), 1639-1653, 2021
252021
Providing electron beam proximity effect correction by simulating write operations of polygonal shapes
HC Wang, JH Chen, SJ Lin, CP Chiang, CK Tsai, WC Huang, RG Liu
US Patent 8,464,186, 2013
252013
Materials requirements of high-speed and low-power spin-orbit-torque magnetic random-access memory
X Li, SJ Lin, M Dc, YC Liao, C Yao, A Naeemi, W Tsai, SX Wang
IEEE Journal of the Electron Devices Society 8, 674-680, 2020
222020
Electron beam lithography system and method for improving throughput
JJ Shin, SJ Lin, WC Wang, BJ Lin
US Patent 8,846,278, 2014
222014
Multiple-grid exposure method
WC Wang, SJ Lin, PY Liu, JJ Shin, BJ Lin
US Patent 8,828,632, 2014
222014
Reflective electron beam lithography: lithography results using CMOS controlled digital pattern generator chip
T Gubiotti, JF Sun, R Freed, F Kidwingira, J Yang, C Bevis, A Carroll, ...
Alternative Lithographic Technologies V 8680, 57-67, 2013
212013
Semiconductor structure and associated operating and fabricating method
C Yu, SJ Lin
US Patent 10,276,784, 2019
202019
Reflective electron-beam lithography: progress toward high-throughput production capability
R Freed, T Gubiotti, J Sun, F Kidwingira, J Yang, U Ummethala, LC Hale, ...
Alternative Lithographic Technologies IV 8323, 100-109, 2012
202012
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