EUV source-mask optimization for 7nm node and beyond X Liu, R Howell, S Hsu, K Yang, K Gronlund, F Driessen, HY Liu, ... Extreme Ultraviolet (EUV) Lithography V 9048, 171-181, 2014 | 55 | 2014 |
Source mask optimization methodology (SMO) and application to real full chip optical proximity correction DQ Zhang, GS Chua, YM Foong, Y Zou, S Hsu, S Baron, M Feng, HY Liu, ... Optical Microlithography XXV 8326, 637-647, 2012 | 31 | 2012 |
SMO for 28-nm logic device and beyond: impact of source and mask complexity on lithography performance S Nagahara, K Yoshimochi, H Yamazaki, K Takeda, T Uchiyama, S Hsu, ... Optical Microlithography XXIII 7640, 561-572, 2010 | 25 | 2010 |
Rule and lithographic process co-optimization X Liu US Patent 9,489,479, 2016 | 24 | 2016 |
Gradient-based pattern and evaluation point selection X Liu, RC Howell US Patent 8,898,599, 2014 | 23 | 2014 |
Feature search by machine learning X Liu, YW Lu US Patent App. 15/531,321, 2017 | 19 | 2017 |
Optimization based on machine learning X Liu US Patent 10,409,165, 2019 | 18 | 2019 |
Design compliant source mask optimization (SMO) R Socha, T Jhaveri, M Dusa, X Liu, L Chen, S Hsu, Z Li, AJ Strojwas Photomask and Next-Generation Lithography Mask Technology XVII 7748, 260-271, 2010 | 16 | 2010 |
" Smart" source, mask, and target co-optimization to improve design related lithographically weak spots NY Chung, PS Kang, NR Bang, JD Kim, SJ Lee, BI Choi, BR Choi, ... Design-Process-Technology Co-optimization for Manufacturability VIII 9053 …, 2014 | 15 | 2014 |
Structure and lattice dynamics of studied by helium-atom scattering M Farzaneh, XF Liu, M El-Batanouny, FC Chou Physical Review B—Condensed Matter and Materials Physics 72 (8), 085409, 2005 | 8 | 2005 |
Computation pipeline of location-dependent variant calls J Ye, W Zhou, L Chen, H Feng, H Chen, X Liu US Patent 10,424,396, 2019 | 3 | 2019 |
Discrete source mask optimization X Liu, RC Howell US Patent 10,558,124, 2020 | 2 | 2020 |
Etch variation tolerant optimization X Liu US Patent 10,191,366, 2019 | 2 | 2019 |
Theoretical and experimental studies of layered magnetic systems X Liu Boston University, 2005 | 2 | 2005 |
Optimization based on machine learning X Liu US Patent 11,029,605, 2021 | | 2021 |
Etch variation tolerant optimization X Liu US Patent 10,712,653, 2020 | | 2020 |
Flows of optimization for lithographic processes DFS Hsu, RC Howell, X Liu US Patent 10,459,346, 2019 | | 2019 |
Pattern placement error aware optimization DFS Hsu, JIA Jianjun, X Liu, C Zhang US Patent 10,386,727, 2019 | | 2019 |
Re-entrant surface antiferromagnetism on the CoO (100) surface. P Banerjee, X Liu, M Farzaneh, S Peng, M El-Batanouny APS March Meeting Abstracts, Y31. 008, 2000 | | 2000 |