| Ultra low p-type SiGe contact resistance FinFETs with Ti silicide liner using cryogenic contact implantation amorphization and solid-phase epitaxial regrowth (SPER) YR Yang, N Breil, CY Yang, J Hsieh, F Chiang, B Colombeau, BN Guo, ... 2016 IEEE Symposium on VLSI Technology, 1-2, 2016 | 27 | 2016 |
| Daptomycin‐loaded polymethylmethacrylate bone cement for joint arthroplasty surgery YM Hsu, CH Liao, YH Wei, HW Fang, HH Hou, CC Chen, CH Chang Artificial organs 38 (6), 484-492, 2014 | 18 | 2014 |
| Fin Bending Mitigation and Local Layout Effect Alleviation in Advanced FinFET Technology through Material Engineering and Metrology Optimization TY Wen, B Colombeau, C Li, SY Liu, BN Guo, HV Meer, M Hou, B Yang, ... 2019 Symposium on VLSI Technology, T110-T111, 2019 | 12 | 2019 |
| p-Type MOSFET Contact Resistance Improvement by Conformal Plasma Doping and Nanosecond Laser Annealing CI Li, N Breil, TY Wen, SY Liu, MS Hsieh, SJ Yen, CW Chang, SH Tsai, ... IEEE Electron Device Letters 40 (2), 307-309, 2019 | 7 | 2019 |
| FinFET IO Device Performance Gain with Heated Implantation TY Wen, CI Li, MS Hsieh, SH Tsai, PK Hsieh, SH Lin, HT Chiang, ... 2018 22nd International Conference on Ion Implantation Technology (IIT), 106-109, 2018 | 4 | 2018 |
| 28nm device improvement studies by replacing indium with gallium halo YL Chin, CH Wei, CY Yang, SW Yeh, WF Chang, SC Huang, CK Chiang, ... 2014 International Workshop on Junction Technology (IWJT), 1-4, 2014 | 2 | 2014 |
| Impact of gallium implant for advanced CMOS halo/pocket optimization YL Chin, CY Yang, TH Lee, SW Yeh, WF Chang, SC Huang, NH Yang, ... 2014 20th International Conference on Ion Implantation Technology (IIT), 1-4, 2014 | 1 | 2014 |
