The excitation structure in a micro-hollow cathode discharge in the normal regime at medium argon pressure C Lazzaroni, P Chabert, A Rousseau, N Sadeghi Journal of Physics D: Applied Physics 43 (12), 124008, 2010 | 53 | 2010 |
Analytical–numerical global model of atmospheric-pressure radio-frequency capacitive discharges C Lazzaroni, P Chabert, MA Lieberman, AJ Lichtenberg, A Leblanc Plasma Sources Science and Technology 21 (3), 035013, 2012 | 50 | 2012 |
Sheath and electron density dynamics in the normal and self-pulsing regime of a micro hollow cathode discharge in argon gas C Lazzaroni, P Chabert, A Rousseau, N Sadeghi The European Physical Journal D 60 (3), 555-563, 2010 | 44 | 2010 |
A model for the self-pulsing regime of microhollow cathode discharges P Chabert, C Lazzaroni, A Rousseau Journal of Applied Physics 108 (11), 2010 | 42 | 2010 |
Particle-in-cell and global simulations of α to γ transition in atmospheric pressure Penning-dominated capacitive discharges E Kawamura, MA Lieberman, AJ Lichtenberg, P Chabert, C Lazzaroni Plasma Sources Science and Technology 23 (3), 035014, 2014 | 38 | 2014 |
NO kinetics in pulsed low-pressure plasmas studied by time-resolved quantum cascade laser absorption spectroscopy S Welzel, O Guaitella, C Lazzaroni, CD Pintassilgo, A Rousseau, ... Plasma Sources Science and Technology 20 (1), 015020, 2011 | 37 | 2011 |
Evidence of atomic adsorption on TiO2 under plasma exposure and related C2H2 surface reactivity O Guaitella, C Lazzaroni, D Marinov, A Rousseau Applied Physics Letters 97 (1), 2010 | 30 | 2010 |
A global model of the self-pulsing regime of micro-hollow cathode discharges C Lazzaroni, P Chabert Journal of Applied Physics 111 (5), 2012 | 28 | 2012 |
A global model of micro-hollow cathode discharges in the stationary regime C Lazzaroni, P Chabert Journal of Physics D: Applied Physics 44 (44), 445202, 2011 | 26 | 2011 |
Comparison of a hybrid model to a global model of atmospheric pressure radio-frequency capacitive discharges C Lazzaroni, MA Lieberman, AJ Lichtenberg, P Chabert Journal of Physics D: Applied Physics 45 (49), 495204, 2012 | 25 | 2012 |
Discharge resistance and power dissipation in the self-pulsing regime of micro-hollow cathode discharges C Lazzaroni, P Chabert Plasma Sources Science and Technology 20 (5), 055004, 2011 | 25 | 2011 |
ZnO and Al doped ZnO thin films deposited by Spray Plasma: Effect of the growth time and Al doping on microstructural, optical and electrical properties K Baba, C Lazzaroni, M Nikravech Thin Solid Films 595, 129-135, 2015 | 24 | 2015 |
A comparison between micro hollow cathode discharges and atmospheric pressure plasma jets in Ar/O2 gas mixtures C Lazzaroni, P Chabert Plasma Sources Science and Technology 25 (6), 065015, 2016 | 23 | 2016 |
A microplasma process for hexagonal boron nitride thin film synthesis H Kabbara, S Kasri, O Brinza, G Bauville, K Gazeli, J Santos Sousa, ... Applied Physics Letters 116 (17), 2020 | 15 | 2020 |
Experimental characterization of a ns-pulsed micro-hollow cathode discharge (MHCD) array in a N2/Ar mixture S Kasri, L William, X Aubert, G Lombardi, A Tallaire, J Achard, ... Plasma Sources Science and Technology 28 (3), 035003, 2019 | 15 | 2019 |
Electrical characteristics of micro-hollow cathode discharges C Lazzaroni, P Chabert Journal of Physics D: Applied Physics 46 (45), 455203, 2013 | 14 | 2013 |
Model of a low-pressure radio-frequency inductive discharge in Ar/O2 used for plasma spray deposition C Lazzaroni, K Baba, M Nikravech, P Chabert Journal of Physics D: Applied Physics 45 (48), 485207, 2012 | 14 | 2012 |
Absolute N-atom density measurement in an Ar/N2 micro-hollow cathode discharge jet by means of ns-two-photon absorption laser-induced fluorescence A Remigy, X Aubert, S Prasanna, K Gazeli, L Invernizzi, G Lombardi, ... Physics of Plasmas 29 (11), 2022 | 8 | 2022 |
Cross-comparison of diagnostic and 0D modeling of a micro-hollow cathode discharge in the stationary regime in an Ar/N2 gas mixture A Remigy, S Kasri, T Darny, H Kabbara, L William, G Bauville, K Gazeli, ... Journal of Physics D: Applied Physics 55 (10), 105202, 2021 | 8 | 2021 |
Growth of ZnO thin films by spray plasma technique: Correlation between spectroscopic measurements and film properties K Baba, C Lazzaroni, M Nikravech Plasma Chemistry and Plasma Processing 34, 1433-1446, 2014 | 8 | 2014 |