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Claudia Lazzaroni
Claudia Lazzaroni
Laboratoire des Sciences des Procédés et des Matériaux (LSPM) - Université Sorbonne Paris Nord
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Year
The excitation structure in a micro-hollow cathode discharge in the normal regime at medium argon pressure
C Lazzaroni, P Chabert, A Rousseau, N Sadeghi
Journal of Physics D: Applied Physics 43 (12), 124008, 2010
532010
Analytical–numerical global model of atmospheric-pressure radio-frequency capacitive discharges
C Lazzaroni, P Chabert, MA Lieberman, AJ Lichtenberg, A Leblanc
Plasma Sources Science and Technology 21 (3), 035013, 2012
502012
Sheath and electron density dynamics in the normal and self-pulsing regime of a micro hollow cathode discharge in argon gas
C Lazzaroni, P Chabert, A Rousseau, N Sadeghi
The European Physical Journal D 60 (3), 555-563, 2010
442010
A model for the self-pulsing regime of microhollow cathode discharges
P Chabert, C Lazzaroni, A Rousseau
Journal of Applied Physics 108 (11), 2010
422010
Particle-in-cell and global simulations of α to γ transition in atmospheric pressure Penning-dominated capacitive discharges
E Kawamura, MA Lieberman, AJ Lichtenberg, P Chabert, C Lazzaroni
Plasma Sources Science and Technology 23 (3), 035014, 2014
382014
NO kinetics in pulsed low-pressure plasmas studied by time-resolved quantum cascade laser absorption spectroscopy
S Welzel, O Guaitella, C Lazzaroni, CD Pintassilgo, A Rousseau, ...
Plasma Sources Science and Technology 20 (1), 015020, 2011
372011
Evidence of atomic adsorption on TiO2 under plasma exposure and related C2H2 surface reactivity
O Guaitella, C Lazzaroni, D Marinov, A Rousseau
Applied Physics Letters 97 (1), 2010
302010
A global model of the self-pulsing regime of micro-hollow cathode discharges
C Lazzaroni, P Chabert
Journal of Applied Physics 111 (5), 2012
282012
A global model of micro-hollow cathode discharges in the stationary regime
C Lazzaroni, P Chabert
Journal of Physics D: Applied Physics 44 (44), 445202, 2011
262011
Comparison of a hybrid model to a global model of atmospheric pressure radio-frequency capacitive discharges
C Lazzaroni, MA Lieberman, AJ Lichtenberg, P Chabert
Journal of Physics D: Applied Physics 45 (49), 495204, 2012
252012
Discharge resistance and power dissipation in the self-pulsing regime of micro-hollow cathode discharges
C Lazzaroni, P Chabert
Plasma Sources Science and Technology 20 (5), 055004, 2011
252011
ZnO and Al doped ZnO thin films deposited by Spray Plasma: Effect of the growth time and Al doping on microstructural, optical and electrical properties
K Baba, C Lazzaroni, M Nikravech
Thin Solid Films 595, 129-135, 2015
242015
A comparison between micro hollow cathode discharges and atmospheric pressure plasma jets in Ar/O2 gas mixtures
C Lazzaroni, P Chabert
Plasma Sources Science and Technology 25 (6), 065015, 2016
232016
A microplasma process for hexagonal boron nitride thin film synthesis
H Kabbara, S Kasri, O Brinza, G Bauville, K Gazeli, J Santos Sousa, ...
Applied Physics Letters 116 (17), 2020
152020
Experimental characterization of a ns-pulsed micro-hollow cathode discharge (MHCD) array in a N2/Ar mixture
S Kasri, L William, X Aubert, G Lombardi, A Tallaire, J Achard, ...
Plasma Sources Science and Technology 28 (3), 035003, 2019
152019
Electrical characteristics of micro-hollow cathode discharges
C Lazzaroni, P Chabert
Journal of Physics D: Applied Physics 46 (45), 455203, 2013
142013
Model of a low-pressure radio-frequency inductive discharge in Ar/O2 used for plasma spray deposition
C Lazzaroni, K Baba, M Nikravech, P Chabert
Journal of Physics D: Applied Physics 45 (48), 485207, 2012
142012
Absolute N-atom density measurement in an Ar/N2 micro-hollow cathode discharge jet by means of ns-two-photon absorption laser-induced fluorescence
A Remigy, X Aubert, S Prasanna, K Gazeli, L Invernizzi, G Lombardi, ...
Physics of Plasmas 29 (11), 2022
82022
Cross-comparison of diagnostic and 0D modeling of a micro-hollow cathode discharge in the stationary regime in an Ar/N2 gas mixture
A Remigy, S Kasri, T Darny, H Kabbara, L William, G Bauville, K Gazeli, ...
Journal of Physics D: Applied Physics 55 (10), 105202, 2021
82021
Growth of ZnO thin films by spray plasma technique: Correlation between spectroscopic measurements and film properties
K Baba, C Lazzaroni, M Nikravech
Plasma Chemistry and Plasma Processing 34, 1433-1446, 2014
82014
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Articles 1–20