| Transparent alumina: a light‐scattering model R Apetz, MPB Van Bruggen Journal of the American Ceramic Society 86 (3), 480-486, 2003 | 1074 | 2003 |
| Transparent sintered corundum with high hardness and strength A Krell, P Blank, H Ma, T Hutzler, MPB van Bruggen, R Apetz Journal of the American Ceramic Society 86 (1), 12-18, 2003 | 385 | 2003 |
| Photoluminescence and electroluminescence of SiGe dots fabricated by island growth R Apetz, L Vescan, A Hartmann, C Dieker, H Lüth Applied Physics Letters 66 (4), 445-447, 1995 | 328 | 1995 |
| High power extreme ultra-violet (EUV) light sources for future lithography J Jonkers Plasma Sources Science and Technology 15 (2), S8, 2006 | 99 | 2006 |
| Room-temperature SiGe light-emitting diodes L Vescan, T Stoica Journal of Luminescence 80 (1-4), 485-489, 1998 | 94 | 1998 |
| Effect of annealing and H2 passivation on the photoluminescence of Si nanocrystals in SiO2 E Neufeld, S Wang, R Apetz, C Buchal, R Carius, CW White, DK Thomas Thin Solid Films 294 (1-2), 238-241, 1997 | 54 | 1997 |
| Room temperature photocurrent spectroscopy of SiGe/Si pin photodiodes grown by selective epitaxy A Vonsovici, L Vescan, R Apetz, A Koster, K Schmidt IEEE Transactions on Electron Devices 45 (2), 538-542, 1998 | 44 | 1998 |
| Frequency scaling in a hollow-cathode-triggered pinch plasma as radiation source in the extreme ultraviolet O Rosier, R Apetz, K Bergmann, J Jonkers, R Wester, W Neff, J Pankert IEEE transactions on plasma science 32 (1), 240-246, 2004 | 43 | 2004 |
| Integrating Philips’ extreme UV source in the alpha-tools J Pankert, R Apetz, K Bergmann, G Derra, M Janssen, J Jonkers, J Klein, ... Emerging Lithographic Technologies IX 5751, 260-271, 2005 | 42 | 2005 |
| Thermal hole emission from Si/Si1−xGex/Si quantum wells by deep level transient spectroscopy O Chretien, R Apetz, L Vescan, A Souifi, H Lüth, K Schmalz, JJ Koulmann Journal of applied physics 78 (9), 5439-5447, 1995 | 38 | 1995 |
| Physical properties of the HCT EUV source J Pankert, K Bergmann, J Klein, W Neff, O Rosier, S Seiwert, C Smith, ... Emerging Lithographic Technologies VII 5037, 112-118, 2003 | 33 | 2003 |
| EUV sources for the alpha-tools J Pankert, R Apetz, K Bergmann, M Damen, G Derra, O Franken, ... Emerging Lithographic Technologies X 6151, 211-219, 2006 | 30 | 2006 |
| Determination of the valence band offset of Si/Si0.7Ge0.3/Si quantum wells using deep level transient spectroscopy L Vescan, R Apetz, H Lüth Journal of applied physics 73 (11), 7427-7430, 1993 | 30 | 1993 |
| Laser-produced plasma versus laser-assisted discharge plasma: physics and technology of extreme ultraviolet lithography light sources G Schriever, O Semprez, J Jonkers, M Yoshioka, R Apetz Journal of Micro/Nanolithography, MEMS, and MOEMS 11 (2), 021104-021104, 2012 | 27 | 2012 |
| Physical properties of the HCT EUV source J Pankert, K Bergmann, J Klein, W Neff, O Rosier, S Seiwert, C Smith, ... Emerging Lithographic Technologies VI 4688, 87-93, 2002 | 24 | 2002 |
| Transparent polycrystalline aluminium oxide MPB Van Bruggen, RTA Apetz, TA Kop, A Krell, T Hutzler US Patent 7,396,792, 2008 | 23 | 2008 |
| Sn DPP source-collector modules: status of alpha resources, beta developments, and the scalability to HVM M Corthout, R Apetz, J Brudermann, M Damen, G Derra, O Franken, ... Emerging Lithographic Technologies XII 6921, 248-259, 2008 | 23 | 2008 |
| Vertical-cavity surface emitting laser-diodes arrays expanding the range of high-power laser systems and applications A Pruijmboom, R Apetz, R Conrads, C Deppe, G Derra, S Gronenborn, ... Journal of Laser Applications 28 (3), 2016 | 20 | 2016 |
| Xenon DPP source technologies for EUVL exposure tools M Yoshioka, D Bolshukhin, M Corthout, GH Derra, S Götze, J Jonkers, ... Alternative Lithographic Technologies 7271, 93-100, 2009 | 20 | 2009 |
| Tin LDP source collector module (SoCoMo) ready for integration into Beta scanner M Yoshioka, Y Teramoto, J Jonkers, MC Schürmann, R Apetz, V Kilian, ... Extreme Ultraviolet (EUV) Lithography II 7969, 511-519, 2011 | 18 | 2011 |
