Nanoscale three-dimensional patterning of molecular resists by scanning probes D Pires, JL Hedrick, A De Silva, J Frommer, B Gotsmann, H Wolf, ... Science 328 (5979), 732-735, 2010 | 389 | 2010 |
Molecular Glass Resists as High‐Resolution Patterning Materials A De Silva, NM Felix, CK Ober Advanced Materials 20 (17), 3355-3361, 2008 | 111 | 2008 |
Study of the Structure− Properties Relationship of Phenolic Molecular Glass Resists for Next Generation Photolithography A De Silva, JK Lee, X André, NM Felix, HB Cao, H Deng, CK Ober Chemistry of Materials 20 (4), 1606-1613, 2008 | 80 | 2008 |
Characterization of the photoacid diffusion length and reaction kinetics in EUV photoresists with IR spectroscopy S Kang, W Wu, KW Choi, A De Silva, CK Ober, VM Prabhu Macromolecules 43 (9), 4275-4286, 2010 | 62 | 2010 |
Fifteen nanometer resolved patterns in selective area atomic layer deposition—defectivity reduction by monolayer design R Wojtecki, M Mettry, NF Fine Nathel, A Friz, A De Silva, N Arellano, ... ACS applied materials & interfaces 10 (44), 38630-38637, 2018 | 54 | 2018 |
Phenolic molecular glasses as resists for next-generation lithography X André, JK Lee, A De Silva, N Felix, CK Ober, HB Cao, H Deng, H Kudo, ... Advances in Resist Materials and Processing Technology XXIV 6519, 1291-1300, 2007 | 46 | 2007 |
EUV patterning successes and frontiers N Felix, D Corliss, K Petrillo, N Saulnier, Y Xu, L Meli, H Tang, A De Silva, ... Extreme Ultraviolet (EUV) Lithography VII 9776, 480-486, 2016 | 41 | 2016 |
Hydroxyphenylbenzene derivatives as glass forming molecules for high resolution photoresists A De Silva, CK Ober Journal of Materials Chemistry 18 (16), 1903-1910, 2008 | 40 | 2008 |
Dissolution phenomena of phenolic molecular glass photoresist films in supercritical CO 2 NM Felix, A De Silva, CMY Luk, CK Ober Journal of Materials Chemistry 17 (43), 4598-4604, 2007 | 31 | 2007 |
Investigation of mask absorber induced image shift in EUV lithography M Burkhardt, A De Silva, J Church, L Meli, C Robinson, N Felix Extreme Ultraviolet (EUV) Lithography X 10957, 232-250, 2019 | 30 | 2019 |
Calix [4] resorcinarene Derivatives as High‐Resolution Resist Materials for Supercritical CO2 Processing NM Felix, A De Silva, CK Ober Advanced Materials 20 (7), 1303-1309, 2008 | 28 | 2008 |
Software installation and condition data distribution via CernVM File System in ATLAS A De Salvo, A De Silva, D Benjamin, J Blomer, P Buncic, A Harutyunyan, ... Journal of Physics: Conference Series 396 (3), 032030, 2012 | 24 | 2012 |
Molecular glass resists for next generation lithography A De Silva, N Felix, J Sha, JK Lee, CK Ober Advances in Resist Materials and Processing Technology XXV 6923, 509-522, 2008 | 24 | 2008 |
Use of trehalose in the semen cryopreservation of Amazonian catfish Leiarius marmoratus SMM Gheller, CD Corcini, CRC de Brito, IB Acosta, GC Tavares, ... Cryobiology 87, 74-77, 2019 | 22 | 2019 |
Fundamentals of EUV resist-inorganic hardmask interactions DL Goldfarb, M Glodde, A De Silva, I Sheshadri, NM Felix, K Lionti, ... Advances in Patterning Materials and Processes XXXIV 10146, 35-47, 2017 | 21 | 2017 |
Solid state NMR investigation of photoresist molecular glasses including blend behavior with a photoacid generator DL VanderHart, VM Prabhu, A De Silva, NM Felix, CK Ober Journal of Materials Chemistry 19 (18), 2683-2694, 2009 | 20 | 2009 |
Fundamentals of resist stochastics effect for single-expose EUV patterning A De Silva, L Meli, DL Goldfarb, NM Felix Extreme Ultraviolet (EUV) Lithography X 10957, 57-67, 2019 | 19 | 2019 |
Defect detection strategies and process partitioning for SE EUV patterning L Meli, K Petrillo, A De Silva, J Arnold, N Felix, C Robinson, B Briggs, ... Extreme Ultraviolet (EUV) Lithography IX 10583, 87-103, 2018 | 18 | 2018 |
Molecular glass resists for EUV lithography A De Silva, D Forman, CK Ober Advances in Resist Technology and Processing XXIII 6153, 1257-1266, 2006 | 18 | 2006 |
Study of alternate hardmasks for extreme ultraviolet patterning A De Silva, I Seshadri, A Arceo, K Petrillo, L Meli, B Mendoza, Y Yao, ... Journal of Vacuum Science & Technology B 34 (6), 2016 | 17 | 2016 |