Level-set-based inverse lithography for mask synthesis using the conjugate gradient and an optimal time step W Lv, S Liu, Q Xia, X Wu, Y Shen, EY Lam Journal of Vacuum Science & Technology B, Nanotechnology and …, 2013 | 49 | 2013 |
High-order residual network for light field super-resolution N Meng, X Wu, J Liu, E Lam Proceedings of the AAAI Conference on Artificial Intelligence 34 (07), 11757 …, 2020 | 35 | 2020 |
Efficient source mask optimization with Zernike polynomial functions for source representation X Wu, S Liu, J Li, EY Lam Optics express 22 (4), 3924-3937, 2014 | 31 | 2014 |
Learning Causal Representation for Training Cross-Domain Pose Estimator via Generative Interventions X Zhang, Y Wong, X Wu, J Lu, M Kankanhalli, X Li, W Geng Proceedings of the IEEE/CVF International Conference on Computer Vision …, 2021 | 25 | 2021 |
Robust and efficient inverse mask synthesis with basis function representation X Wu, S Liu, W Lv, EY Lam JOSA A 31 (12), B1-B9, 2014 | 16 | 2014 |
Illumination source optimization in optical lithography via derivative-free optimization W Lv, S Liu, X Wu, EY Lam JOSA A, 2014 | 15 | 2014 |
Iterative method for in situ measurement of lens aberrations in lithographic tools using CTC-based quadratic aberration model S Liu, S Xu, X Wu, W Liu Optics express 20 (13), 14272-14283, 2012 | 12 | 2012 |
Comparison of three TCC calculation algorithms for partially coherent imaging simulation X Wu, S Liu, W Liu, T Zhou, L Wang Sixth International Symposium on Precision Engineering Measurements and …, 2010 | 11 | 2010 |
Fast aerial image simulations using one basis mask pattern for optical proximity correction S Liu, X Wu, W Liu, C Zhang Journal of Vacuum Science & Technology B, Nanotechnology and …, 2011 | 7 | 2011 |
Sparse nonlinear inverse imaging for shot count reduction in inverse lithography X Wu, S Liu, W Lv, EY Lam Optics Express 23 (21), 26919-26931, 2015 | 6 | 2015 |
Unifiedgesture: A unified gesture synthesis model for multiple skeletons S Yang, Z Wang, Z Wu, M Li, Z Zhang, Q Huang, L Hao, S Xu, X Wu, ... Proceedings of the 31st ACM International Conference on Multimedia, 1033-1044, 2023 | 5 | 2023 |
Fast evaluation of aberration-induced intensity distribution in partially coherent imaging systems by cross triple correlation L Shi-Yuan, L Wei, W Xiao-Fei Chinese Physics Letters 28 (10), 104212, 2011 | 5 | 2011 |
VastGaussian: Vast 3D Gaussians for Large Scene Reconstruction J Lin, Z Li, X Tang, J Liu, S Liu, J Liu, Y Lu, X Wu, S Xu, Y Yan, W Yang arXiv preprint arXiv:2402.17427, 2024 | 4 | 2024 |
Incorporating photomask shape uncertainty in computational lithography X Wu, S Liu, A Erdmann, EY Lam SPIE Advanced Lithography, 97800Q-97800Q-10, 2016 | 4 | 2016 |
Impact of photomask shape uncertainties on computational lithography EY Lam, X Wu 2016 China Semiconductor Technology International Conference (CSTIC), 1-4, 2016 | 3 | 2016 |
基于 Sigmoid 函数的离轴照明光源全参数解析模型 刘巍, 刘世元, 吴小飞, 张传维 物理学报 60 (5), 383-391, 2011 | 2 | 2011 |
Decorate3D: Text-Driven High-Quality Texture Generation for Mesh Decoration in the Wild Y Guo, X Zuo, P Dai, J Lu, X Wu, L Cheng, Y Yan, S Xu, X Wu Thirty-seventh Conference on Neural Information Processing Systems, 2023 | 1 | 2023 |
Levet-set-based inverse lithography under random field shape uncertainty in a vector Hopkins imaging model X Wu, T Fühner, A Erdmann, EY Lam Computational Optical Sensing and Imaging, CW1B. 4, 2017 | 1 | 2017 |
Computational techniques to incorporate shot count reduction into inverse lithography X Wu, S Liu, EY Lam 2015 China Semiconductor Technology International Conference, 1-3, 2015 | 1 | 2015 |
Automated source/mask/directed self-assembly optimization using a self-adaptive hierarchical modeling approach T Fühner, P Michalak, X Wu, A Erdmann 2016 International Conference on Simulation of Semiconductor Processes and …, 2016 | | 2016 |