| Photolithography systems and associated methods of overlay error correction WJ Chung US Patent 8,260,449, 2012 | 19* | 2012 |
| Analysis of wafer heating in 14nm DUV layers L Subramany, WJ Chung, P Samudrala, H Gao, N Aung, JM Gomez, ... Metrology, Inspection, and Process Control for Microlithography XXX 9778 …, 2016 | 11 | 2016 |
| Photolithography systems and associated methods of focus correction WJ Chung US Patent 8,203,695, 2012 | 11 | 2012 |
| Overlay control for 7nm technology node and beyond N Aung, WJ Chung, P Samudrala, H Gao, W Gao, D Brown, G He, B Park, ... Optical Microlithography XXXI 10587, 62-73, 2018 | 10 | 2018 |
| Integrated production overlay field-by-field control for leading edge technology nodes WJ Chung, J Tristan, K Gutjahr, L Subramany, C Li, Y Sun, M Yelverton, ... Metrology, Inspection, and Process Control for Microlithography XXVIII 9050 …, 2014 | 7 | 2014 |
| Advanced overlay: sampling and modeling for optimized run-to-run control L Subramany, WJ Chung, P Samudrala, H Gao, N Aung, JM Gomez, ... Metrology, Inspection, and Process Control for Microlithography XXX 9778 …, 2016 | 5 | 2016 |
| Photolithography monitoring mark, photolithography mask comprising an exposure monitoring mark, and phase shift mask comprising an exposure monitoring mark WJ Chung US Patent 8,313,877, 2012 | 5 | 2012 |
| Run time scanner data analysis for HVM lithography process monitoring and stability control WJ Chung, YK Kim, J Tristan, JS Kim, L Subramany, C Li, B Riggs, ... Metrology, Inspection, and Process Control for Microlithography XXVIII 9050 …, 2014 | 4 | 2014 |
| Process influence study on optical model generation during model-based OPC development CT Lim, V Temchenko, WJ Chung, D Wallis, R Wildfeuer, U Mierau, ... Data Analysis and Modeling for Process Control III 6155, 9-18, 2006 | 4 | 2006 |
| Comparison study of diffraction based overlay and image based overlay measurements on programmed overlay errors H Gao, WJ Chung, N Aung, L Subramany, P Samudrala, JM Gomez Metrology, Inspection, and Process Control for Microlithography XXX 9778 …, 2016 | 3 | 2016 |
| Overlay optimization for 1x node technology and beyond via rule based sparse sampling NL Aung, WJ Chung, L Subramany, S Hussain, P Samudrala, H Gao, ... Metrology, Inspection, and Process Control for Microlithography XXX 9778 …, 2016 | 3 | 2016 |
| CPE run-to-run overlay control for high volume manufacturing L Subramany, WJ Chung, K Gutjhar, M Garcia-Medina, C Sparka, L Yap, ... 2015 26th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC …, 2015 | 3 | 2015 |
| Alignment performance monitoring for ASML systems WJ Chung, V Temchenko, T Hauck, S Schmidt Data Analysis and Modeling for Process Control III 6155, 115-124, 2006 | 3 | 2006 |
| Novel methodology to optimize wafer alignment to enhance 14nm on product overlay P Samudrala, WJ Chung, L Subramany, H Gao, N Aung, SC Oh, S Lee, ... Optical Microlithography XXX 10147, 530-535, 2017 | 2 | 2017 |
| Photolithography systems and associated methods of overlay error correction WJ Chung US Patent 9,195,149, 2015 | 2 | 2015 |
| HVM capabilities of CPE run-to-run overlay control L Subramany, WJ Chung, K Gutjahr, M Garcia-Medina, C Sparka, L Yap, ... Metrology, Inspection, and Process Control for Microlithography XXIX 9424 …, 2015 | 2 | 2015 |
| Lithography focus/exposure control and corrections to improve CDU at post etch step YK Kim, M Yelverton, J Tristan, J Lee, K Gutjahr, CH Hsu, H Wei, L Wang, ... Metrology, Inspection, and Process Control for Microlithography XXVIII 9050 …, 2014 | 2 | 2014 |
| Alignment solutions on FBEOL layers using ASML scanners: AEPM: Advanced equipment processes and materials P Samudrala, G Hart, YJ Chen, L Subramany, H Gao, N Aung, WJ Chung, ... 2018 29th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC …, 2018 | 1 | 2018 |
| Alignment solutions on FBEOL layers using ASML scanners P Samudrala, G Hart, YJ Chen, L Subramany, H Gao, N Aung, WJ Chung, ... Optical Microlithography XXX 10147, 523-529, 2017 | 1 | 2017 |
| Evaluation of alignment performance of different exposure tools under various CMP conditions IK Abramovich, WJ Chung Metrology, Inspection, and Process Control for Microlithography XVIII 5375 …, 2004 | 1 | 2004 |
Nyan AungPrinceton UniversityVerified email at princeton.edu
