Compact models of negative-capacitance FinFETs: Lumped and distributed charge models JP Duarte, S Khandelwal, AI Khan, A Sachid, YK Lin, HL Chang, ... 2016 IEEE International Electron Devices Meeting (IEDM), 30.5. 1-30.5. 4, 2016 | 101 | 2016 |
Engineering negative differential resistance in NCFETs for analog applications H Agarwal, P Kushwaha, JP Duarte, YK Lin, AB Sachid, MY Kao, ... IEEE Transactions on Electron Devices 65 (5), 2033-2039, 2018 | 100 | 2018 |
Stress-induced hump effects of p-channel polycrystalline silicon thin-film transistors CF Huang, CY Peng, YJ Yang, HC Sun, HC Chang, PS Kuo, HL Chang, ... IEEE Electron Device Letters 29 (12), 1332-1335, 2008 | 71 | 2008 |
Variation caused by spatial distribution of dielectric and ferroelectric grains in a negative capacitance field-effect transistor MY Kao, AB Sachid, YK Lin, YH Liao, H Agarwal, P Kushwaha, JP Duarte, ... IEEE Transactions on Electron Devices 65 (10), 4652-4658, 2018 | 39 | 2018 |
Designing 0.5 V 5-nm HP and 0.23 V 5-nm LP NC-FinFETs With Improved Sensitivity in Presence of Parasitic Capacitance H Agarwal, P Kushwaha, JP Duarte, YK Lin, AB Sachid, HL Chang, ... IEEE Transactions on Electron Devices 65 (3), 1211-1216, 2018 | 33 | 2018 |
Physical mechanism of HfO2-based bipolar resistive random access memory HL Chang, HC Li, CW Liu, F Chen, MJ Tsai Proceedings of 2011 International Symposium on VLSI Technology, Systems and …, 2011 | 30 | 2011 |
BSIM-HV: High-voltage MOSFET model including quasi-saturation and self-heating effect H Agarwal, C Gupta, R Goel, P Kushwaha, YK Lin, MY Kao, JP Duarte, ... IEEE Transactions on Electron Devices 66 (10), 4258-4263, 2019 | 25 | 2019 |
Coupling effects of dual SiGe power amplifiers for 802.11 n MIMO applications WC Hua, PT Lin, CP Lin, CY Lin, HL Chang, CW Liu, TY Yang, GK Ma IEEE Radio Frequency Integrated Circuits (RFIC) Symposium, 2006, 4 pp., 2006 | 23 | 2006 |
A predictive tunnel FET compact model with atomistic simulation validation YK Lin, S Khandelwal, JP Duarte, HL Chang, S Salahuddin, C Hu IEEE Transactions on Electron Devices 64 (2), 599-605, 2016 | 22 | 2016 |
Effect of polycrystallinity and presence of dielectric phases on NC-FinFET variability YK Lin, MY Kao, H Agarwal, YH Liao, P Kushwaha, K Chatterjee, ... 2018 IEEE International Electron Devices Meeting (IEDM), 9.4. 1-9.4. 4, 2018 | 18 | 2018 |
Modeling of advanced RF bulk FinFETs P Kushwaha, H Agarwal, YK Lin, MY Kao, JP Duarte, HL Chang, W Wong, ... IEEE Electron Device Letters 39 (6), 791-794, 2018 | 16 | 2018 |
Compact modeling source-to-drain tunneling in sub-10-nm GAA FinFET with industry standard model YK Lin, JP Duarte, P Kushwaha, H Agarwal, HL Chang, A Sachid, ... IEEE Transactions on Electron Devices 64 (9), 3576-3581, 2017 | 16 | 2017 |
Modeling of Subsurface Leakage Current in LowShort Channel MOSFET at Accumulation Bias YK Lin, S Khandelwal, AS Medury, H Agarwal, HL Chang, YS Chauhan, ... IEEE Transactions on Electron Devices 63 (5), 1840-1845, 2016 | 16 | 2016 |
Modeling of back-gate effects on gate-induced drain leakage and gate currents in UTB SOI MOSFETs YK Lin, P Kushwaha, H Agarwal, HL Chang, JP Duarte, AB Sachid, ... IEEE Transactions on Electron Devices 64 (10), 3986-3990, 2017 | 15 | 2017 |
Negative-capacitance FinFETs: Numerical simulation, compact modeling and circuit evaluation JP Duarte, YK Lin, YH Liao, A Sachid, MY Kao, H Agarwal, P Kushwaha, ... 2018 International conference on simulation of semiconductor processes and …, 2018 | 13 | 2018 |
BSIM-BULK 106.2. 0 MOSFET Compact Model Technical Manual H Agarwal, C Gupta, HL Chang, S Khandelwal, JP Duarte, YS Chauhan, ... Univ. California, Berkeley, 2017 | 12 | 2017 |
Improved SPICE macromodel of phase change random access memory HL Chang, HC Chang, SC Yang, HC Tsai, HC Li, CW Liu 2009 International Symposium on VLSI Design, Automation and Test, 134-137, 2009 | 10 | 2009 |
BSIM-BULK106. 2.0 Technical Manual H Agarwal, C Gupta, SKH Chang, JP Duarte, YS Chauhan, S Salahuddin, ... University of California, Berkeley, CA, USA.[Online]. Available: http://bsim …, 2017 | 9 | 2017 |
Modeling of GeOI and validation with Ge-CMOS inverter circuit using BSIM-IMG industry standard model H Agarwal, P Kushwaha, YS Chauhan, S Khandelwal, JP Duarte, YK Lin, ... 2016 IEEE International Conference on Electron Devices and Solid-State …, 2016 | 9 | 2016 |
New mobility model for accurate modeling of transconductance in FDSOI MOSFETs YK Lin, P Kushwaha, JP Duarte, HL Chang, H Agarwal, S Khandelwal, ... IEEE Transactions on Electron Devices 65 (2), 463-469, 2018 | 8 | 2018 |