‪Ling-Ya Tseng‬ - ‪Google Scholar‬

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202020212022202320242 4 4 9 9

Co-authors

Yan-Cheng LinAssistant Professor, National Cheng Kung UniversityVerified email at gs.ncku.edu.tw
Chi-Ching KuoNational Taipei University of TechnologyVerified email at mail.ntut.edu.tw
Chun-Kai Chen (陳俊愷)國立臺灣大學化學工程所Verified email at ntu.edu.tw

Ling-Ya Tseng

Ling-Ya Tseng

National Taipei University of Technology

Verified email at ntut.edu.tw

Photosensitive polyimide Negative-type photoresist


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An ultra heat-resistant polyimide formulated with photo-base generator for alkaline-developable, negative-type photoresist LY Tseng, YC Lin, CC Kuo, CC Kuo, M Ueda, WC Chen Reactive and Functional Polymers 157, 104760, 2020	12	2020
Alkaline‐developable and negative‐type photosensitive polyimide with high sensitivity and excellent mechanical properties using photo‐base generator LY Tseng, YC Lin, CC Kuo, CK Chen, CE Wang, CC Kuo, M Ueda, ... Journal of Polymer Science 58 (17), 2366-2375, 2020	12	2020
Investigating the structure–sensitivity relationship of photosensitive polyimide formulated by using a photobase generator EC Chang, LY Tseng, Y Liu, CK Chen, CC Kuo, M Ueda, YC Lin, ... Journal of Polymer Science 61 (18), 2122-2132, 2023	4	2023

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