| EUV patterning successes and frontiers N Felix, D Corliss, K Petrillo, N Saulnier, Y Xu, L Meli, H Tang, A De Silva, ... Extreme Ultraviolet (EUV) Lithography VII 9776, 480-486, 2016 | 39 | 2016 |
| BEOL process integration for the 7 nm technology node T Standaert, G Beique, HC Chen, ST Chen, B Hamieh, J Lee, ... 2016 IEEE international interconnect technology conference/advanced …, 2016 | 37 | 2016 |
| Alternative materials for high numerical aperture extreme ultraviolet lithography mask stacks O Wood II, S Raghunathan, P Mangat, V Philipsen, V Luong, P Kearney, ... Extreme Ultraviolet (EUV) Lithography VI 9422, 122-133, 2015 | 37 | 2015 |
| Imaging impact of multilayer tuning in EUV masks, experimental validation V Philipsen, E Hendrickx, E Verduijn, S Raghunathan, O Wood II, ... Photomask Technology 2014 9235, 115-127, 2014 | 29 | 2014 |
| Comparison of left and right side line edge roughness in lithography L Sun, N Saulnier, G Beique, E Verduijn, W Wang, Y Xu, H Tang, Y Chen, ... Metrology, Inspection, and Process Control for Microlithography XXX 9778 …, 2016 | 22 | 2016 |
| Experimental measurements of telecentricity errors in high-numerical-aperture extreme ultraviolet mask images S Raghunathan, OR Wood, P Mangat, E Verduijn, V Philipsen, ... Journal of Vacuum Science & Technology B 32 (6), 2014 | 20 | 2014 |
| Line edge roughness frequency analysis for SAQP process L Sun, X Zhang, S Levi, A Ge, H Zhou, W Wang, N Krishnan, Y Chen, ... Optical Microlithography XXIX 9780, 247-252, 2016 | 18 | 2016 |
| Mask blank defect printability comparison using optical and SEM mask and wafer inspection and bright field actinic mask imaging P Mangat, E Verduijn, OR Wood II, MP Benk, A Wojdyla, KA Goldberg Photomask Japan 2015: Photomask and Next-Generation Lithography Mask …, 2015 | 17 | 2015 |
| EUV vote-taking lithography: crazy... or not? J Bekaert, P De Bisschop, C Beral, E Hendrickx, MA van de Kerkhof, ... Extreme Ultraviolet (EUV) Lithography IX 10583, 114-130, 2018 | 16 | 2018 |
| SAV using selective SAQP/SADP W Wang, RRH Kim, L Sun, E Verduijn, Y Chen US Patent 9,478,462, 2016 | 16 | 2016 |
| Deconstructing contact hole CD printing variability in EUV lithography D Civay, T Wallow, N Doganaksoy, E Verduijn, G Schmid, P Mangat Extreme Ultraviolet (EUV) Lithography V 9048, 808-824, 2014 | 14 | 2014 |
| Printability and actinic AIMS review of programmed mask blank defects E Verduijn, P Mangat, O Wood, J Rankin, Y Chen, F Goodwin, R Capelli, ... Extreme Ultraviolet (EUV) Lithography VIII 10143, 112-124, 2017 | 12 | 2017 |
| Tunneling magnetoresistance of Co2MnGe∕ Al2O3∕ Co junctions EA Verduijn, K Westerholt Journal of applied physics 99 (8), 2006 | 11 | 2006 |
| Method for producing self-aligned vias RRH Kim, W Wang, L Sun, E Verduijn, Y Chen US Patent 9,484,258, 2016 | 9 | 2016 |
| Measurement of EUV lithography pupil amplitude and phase variation via image-based methodology Z Levinson, E Verduijn, OR Wood, P Mangat, KA Goldberg, MP Benk, ... Journal of Micro/Nanolithography, MEMS, and MOEMS 15 (2), 023508-023508, 2016 | 9 | 2016 |
| Review of resist-based flare measurement methods for extreme ultraviolet lithography L Sun, OR Wood, EA Verduijn, M Singh, W Wang, RH Kim, P Mangat, ... Journal of Micro/Nanolithography, MEMS, and MOEMS 12 (4), 042001-042001, 2013 | 7 | 2013 |
| Evaluation of EUV mask impacts on wafer line-edge roughness using aerial and SEM image analyses X Chen, E Verduijn, O Wood, T Brunner, R Capelli, D Hellweg, M Dietzel, ... Extreme Ultraviolet (EUV) Lithography IX 10583, 131-140, 2018 | 6 | 2018 |
| EUV actinic brightfield mask microscopy for predicting printed defect images K Goldberg, MP Benk, A Wojdyla, E Verduijn, OR Wood II, P Mangat Photomask Technology 2015 9635, 271-277, 2015 | 6 | 2015 |
| Subresolution assist features in extreme ultraviolet lithography D Civay, E Verduijn, C Clifford, P Mangat, T Wallow Journal of Micro/Nanolithography, MEMS, and MOEMS 14 (2), 023501-023501, 2015 | 6 | 2015 |
| Prediction of EUV stochastic microbridge probabilities by lithography simulations E Verduijn, U Welling, J Tang, HJ Stock, U Klostermann, W Demmerle, ... Extreme Ultraviolet (EUV) Lithography XI 11323, 131-139, 2020 | 4 | 2020 |
