| Surface plasmon resonance studies of gold and silver nanoparticles linked to gold and silver substrates by 2-aminoethanethiol and 1, 6-hexanedithiol E Hutter, JH Fendler, D Roy The Journal of Physical Chemistry B 105 (45), 11159-11168, 2001 | 242 | 2001 |
| Reflection and absorption techniques for optical characterization of chemically assembled nanomaterials D Roy, J Fendler Advanced materials 16 (6), 479-508, 2004 | 178 | 2004 |
| Electro-oxidation of methanol on gold in alkaline media: Adsorption characteristics of reaction intermediates studied using time resolved electro-chemical impedance and surface … KA Assiongbon, D Roy Surface Science 594 (1-3), 99-119, 2005 | 173 | 2005 |
| Analysis of experimental constraints and variables for time resolved detection of Fourier transform electrochemical impedance spectra JE Garland, CM Pettit, D Roy Electrochimica Acta 49 (16), 2623-2635, 2004 | 134 | 2004 |
| Role of substrate metal in gold nanoparticle enhanced surface plasmon resonance imaging E Hutter, S Cha, JF Liu, J Park, J Yi, JH Fendler, D Roy The Journal of Physical Chemistry B 105 (1), 8-12, 2001 | 129 | 2001 |
| Nature of the active site in surface-enhanced Raman scattering TE Furtak, D Roy Physical Review Letters 50 (17), 1301, 1983 | 128 | 1983 |
| Evidence for Ag cluster vibrations in enhanced Raman scattering from the Ag/electrolyte interface D Roy, TE Furtak Chemical physics letters 124 (4), 299-303, 1986 | 124 | 1986 |
| PEGylated imidazolium ionic liquid electrolytes: thermophysical and electrochemical properties LVNR Ganapatibhotla, J Zheng, D Roy, S Krishnan Chemistry of Materials 22 (23), 6347-6360, 2010 | 119 | 2010 |
| The short-range mechanism of surface enhanced Raman scattering TE Furtak, D Roy Surface Science 158 (1-3), 126-146, 1985 | 119 | 1985 |
| Achievement of high planarization efficiency in CMP of copper at a reduced down pressure S Pandija, D Roy, SV Babu Microelectronic Engineering 86 (3), 367-373, 2009 | 104 | 2009 |
| Probing the electrochemical double layer of an ionic liquid using voltammetry and impedance spectroscopy: A comparative study of carbon nanotube and glassy carbon electrodes in … JP Zheng, PC Goonetilleke, CM Pettit, D Roy Talanta 81 (3), 1045-1055, 2010 | 103 | 2010 |
| Synergistic roles of dodecyl sulfate and benzotriazole in enhancing the efficiency of CMP of copper Y Hong, VK Devarapalli, D Roy, SV Babu Journal of the Electrochemical Society 154 (6), H444, 2007 | 101 | 2007 |
| Relative roles of H 2 O 2 and glycine in CMP of copper studied with impedance spectroscopy J Lu, JE Garland, CM Pettit, SV Babu, D Roy Journal of the Electrochemical Society 151 (10), G717, 2004 | 100 | 2004 |
| Citric acid as a complexing agent in CMP of copper: Investigation of surface reactions using impedance spectroscopy VRK Gorantla, KA Assiongbon, SV Babu, D Roy Journal of the Electrochemical Society 152 (5), G404, 2005 | 98 | 2005 |
| Controlling the galvanic corrosion of copper during chemical mechanical planarization of ruthenium barrier films BC Peethala, D Roy, SV Babu Electrochemical and Solid-State Letters 14 (7), H306, 2011 | 90 | 2011 |
| Chemical mechanical planarization of copper using abrasive-free solutions of oxalic acid and hydrogen peroxide S Pandija, D Roy, SV Babu Materials chemistry and physics 102 (2-3), 144-151, 2007 | 82 | 2007 |
| Electrochemical windows and impedance characteristics of [Bmim+][BF4-] and [Bdmim+][BF4-] ionic liquids at the surfaces of Au, Pt, Ta and glassy carbon electrodes SS Moganty, RE Baltus, D Roy Chemical Physics Letters 483 (1-3), 90-94, 2009 | 76 | 2009 |
| Relative roles of acetic acid, dodecyl sulfate and benzotriazole in chemical mechanical and electrochemical mechanical planarization of copper PC Goonetilleke, D Roy Applied surface science 254 (9), 2696-2707, 2008 | 72 | 2008 |
| Chemical and Mechanical Aspects of a Co-Cu Planarization Scheme Based on an Alkaline Slurry Formulation M Turk, X Shi, D Gonyer, D Roy ECS Journal of Solid State Science and Technology 5 (2), P88-P99, 2016 | 68 | 2016 |
| Electrochemical characterization of surface complexes formed on Cu and Ta in succinic acid based solutions used for chemical mechanical planarization CM Sulyma, D Roy Applied Surface Science 256 (8), 2583-2595, 2010 | 67 | 2010 |
JP ZhengCabot Microelectronics, Clarkson UniversityVerified email at clarkson.edu
