Technique to tune sidewall passivation deposition conformality for high aspect ratio cylinder etch N Dole, EA Hudson, G Matamis US Patent 10,170,324, 2019 | 58 | 2019 |
Technique to deposit sidewall passivation for high aspect ratio cylinder etch EA Hudson, N Dole US Patent 9,543,158, 2017 | 40 | 2017 |
Technique to deposit sidewall passivation for high aspect ratio cylinder etch EA Hudson, N Dole US Patent 10,297,459, 2019 | 27 | 2019 |
Fundamentals and applications of plasma cleaning DPR Thanu, ES Srinadhu, M Zhao, NV Dole, M Keswani Developments in surface contamination and cleaning: applications of cleaning …, 2019 | 17 | 2019 |
Pb Monolayer Mediated Thin Film Growth of Cu and Co: Exploring Different Concepts D Wu, DJ Solanki, A Joi, Y Dordi, N Dole, D Litvnov, SR Brankovic Journal of The Electrochemical Society 166 (1), D3013, 2018 | 13 | 2018 |
Electroless deposition of Pb monolayer: a new process and application to surface selective atomic layer deposition D Wu, DJ Solanki, JL Ramirez, W Yang, A Joi, Y Dordi, N Dole, ... Langmuir 34 (38), 11384-11394, 2018 | 11 | 2018 |
Reaction kinetics of metal deposition via surface limited redox replacement of underpotentially deposited monolayer studied by surface reflectivity and open circuit potential … E Bulut, D Wu, N Dole, H Kilic, SR Brankovic Journal of The Electrochemical Society 164 (4), D159, 2017 | 11 | 2017 |
Three or more states for achieving high aspect ratio dielectric etch T Yanagawa, N Dole, R Bhowmick, E Hudson, FL Kozakevich, J Holland, ... US Patent 10,504,744, 2019 | 8 | 2019 |
Underpotential and electroless Pb monolayer deposition on Ru (0001) D Wu, K Ahmadi, N Dole, A Joi, Y Dordi, SR Brankovic Journal of The Electrochemical Society 166 (10), D359, 2019 | 8 | 2019 |
Developments in Surface Contamination and Cleaning: Applications of Cleaning Techniques DPR Thanu, ES Srinadhu, M Zhao, NV Dole, M Keswani Elsevier, 2019 | 7 | 2019 |
Crack free Cr coatings from Cr3+ electrolyte K Ahmadi, N Dole, O Karadavut, FCR Hernandez, TD Hall, EJ Taylor, ... Journal of The Electrochemical Society 169 (1), 012504, 2022 | 5 | 2022 |
Tuning surface chemoresistivity of au ultrathin films using metal deposition via surface-limited redox replacement of the underpotentially deposited Pb monolayer K Ahmadi, D Wu, N Dole, OR Monteiro, SR Brankovic ACS sensors 4 (9), 2442-2449, 2019 | 5 | 2019 |
Electroless Pb Monolayer Deposition—Prelude for Further Advances in Catalyst Monolayer Synthesis via Surface Limited Redox Replacement Reaction K Ahmadi, N Dole, D Wu, T Salavati-Fard, LC Grabow, ... ACS Catalysis 11 (8), 4650-4659, 2021 | 4 | 2021 |
Method of achieving high selectivity for high aspect ratio dielectric etch N Dole, T Yanagawa US Patent 10,515,821, 2019 | 3 | 2019 |
Use of Surfactants in Acoustic Cleaning DPR Thanu, A Antoniswamy, VV Swaminathan, ES Srinadhu, N Dole, ... Surfactants in Precision Cleaning, 193-226, 2022 | 2 | 2022 |
Three or more states for achieving high aspect ratio dielectric etch T Yanagawa, N Dole, R Bhowmick, E Hudson, FL Kozakevich, J Holland, ... US Patent 10,861,708, 2020 | 2 | 2020 |
Strained Annealing of Cu Interconnects—The Novel Approach Towards Improving Resistance of Cu Nanostructures N Dole, J Chawla, S Brankovic TECHCON, BEOL Processing and Reliability, 2013 | 2 | 2013 |
Multiple State Pulsing for High Aspect Ratio Etch JOI Aniruddha, N Dole, M Wong, E Hudson, J Sheth US Patent App. 18/011,505, 2024 | | 2024 |
Systems and methods for etching a high aspect ratio structure N Dole, T Yanagawa, EA Hudson, M Wong, JOI Aniruddha US Patent App. 18/011,837, 2024 | | 2024 |
Corona Treatment of Polymer Surfaces to Enhance Adhesion N Dole, K Ahmadi, D Solanki, V Swaminathan, V Keswani, M Keswani Polymer Surface Modification to Enhance Adhesion: Techniques and …, 2024 | | 2024 |