Wide optical gap B-doped nc-Si thin films with advanced crystallinity and conductivity on transparent flexible substrates for potential low-cost flexible electronics including … D Das, C Patra Materials Advances 2 (6), 2055-2067, 2021 | 17 | 2021 |
Electrically active boron doping in the core of Si nanocrystals by planar inductively coupled plasma CVD C Patra, D Das Journal of Applied Physics 126 (15), 2019 | 15 | 2019 |
Room temperature synthesized highly conducting B-doped nanocrystalline silicon thin films on flexible polymer substrates by ICP-CVD C Patra, D Das Applied Surface Science 583, 152499, 2022 | 3 | 2022 |
Maintaining superior crystallinity and conductivity in boron-doped nc-Si ultra-thin films by hydrogen plasma treatment C Patra, D Das Journal of Physics and Chemistry of Solids 157, 110199, 2021 | 2 | 2021 |
Superior phosphorous doping in nanocrystalline silicon thin films and their application as emitter layers in silicon heterojunction solar cells D Das, C Patra Energy & Fuels 37 (8), 6062-6077, 2023 | 1 | 2023 |
Controlling superior crystallinity and conductivity in ultra-thin doped nc-Si layers via H2-plasma treatment for applications in nc-Si/c-Si heterojunction solar cells C Patra, D Das AIP Conference Proceedings 2244 (1), 2020 | 1 | 2020 |
Low temperature growth of highly conducting boron doped nc-Si thin films on flexible substrates D Das, C Patra AIP Conference Proceedings 2244 (1), 2020 | 1 | 2020 |
Maintaining significant ultra-nanocrystallinity in electrically conducting boron doped silicon thin layers for solar cells D Das, C Patra AIP Conference Proceedings 1942 (1), 2018 | 1 | 2018 |
Highly conducting p-type nanocrystalline silicon thin films preparation without additional hydrogen dilution C Patra, D Das AIP Conference Proceedings 1942 (1), 2018 | 1 | 2018 |
Intrinsic, P-doped and B-doped nanocrystalline silicon thin films grown at room temperature on flexible substrates for photovoltaic applications C Patra, D Das Materials Today: Proceedings 62, 5110-5113, 2022 | | 2022 |
Growth Characterization and Optimization of Doped Nanocrystalline Silicon Thin Film by Plasma CVD for Device Applications C Patra Kolkata, 0 | | |